JPS639130U - - Google Patents
Info
- Publication number
- JPS639130U JPS639130U JP10248186U JP10248186U JPS639130U JP S639130 U JPS639130 U JP S639130U JP 10248186 U JP10248186 U JP 10248186U JP 10248186 U JP10248186 U JP 10248186U JP S639130 U JPS639130 U JP S639130U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- organic solvent
- drain cup
- wafer chuck
- discharging
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 229920002120 photoresistant polymer Polymers 0.000 claims description 4
- 238000007599 discharging Methods 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 claims description 2
- 239000003960 organic solvent Substances 0.000 claims 3
- 238000004528 spin coating Methods 0.000 claims 1
Landscapes
- Coating Apparatus (AREA)
Description
第１図はこの考案の一実施例を示すレジスト塗
布装置の断面図、第２図は従来のレジスト塗布装
置を示す断面図である。
図において、１はフオトレジストを吐出するノ
ズル、２はフオトレジスト膜が形成されるウエハ
、３はドレインカツプ、４はドレインチユーブ、
５はシリンダ、６はウエハチヤツク、７は洗浄ノ
ズルである。なお、各図中の同一符号は同一また
は相当部分を示す。
FIG. 1 is a sectional view of a resist coating apparatus showing an embodiment of this invention, and FIG. 2 is a sectional view of a conventional resist coating apparatus. In the figure, 1 is a nozzle for discharging photoresist, 2 is a wafer on which a photoresist film is formed, 3 is a drain cup, 4 is a drain tube,
5 is a cylinder, 6 is a wafer chuck, and 7 is a cleaning nozzle. Note that the same reference numerals in each figure indicate the same or corresponding parts.
Claims (1)
たウエハにフオトレジストを回転塗布するレジス
ト塗布装置において、前記回転塗布時に飛び散つ
て付着したフオトレジストを溶解する有機溶剤を
前記ウエハチヤツクの回転とともに、前記ウエハ
の裏面に向けて吐出せしめる洗浄ノズルを前記ド
レインカツプに取り付けるとともに、前記有機溶
剤の吐出中に前記ドレインカツプまたはウエハチ
ヤツクを上下動せしめる手段を備えたことを特徴
とするレジスト塗布装置。 In a resist coating device that spin-coats a photoresist onto a wafer adsorbed to a wafer chuck in a drain cup, an organic solvent for dissolving the photoresist that has spattered and adhered during the spin coating is applied to the back surface of the wafer as the wafer chuck rotates. 1. A resist coating apparatus, characterized in that a cleaning nozzle for discharging the organic solvent is attached to the drain cup, and means for vertically moving the drain cup or the wafer chuck while discharging the organic solvent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10248186U JPS639130U (en) | 1986-07-02 | 1986-07-02 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10248186U JPS639130U (en) | 1986-07-02 | 1986-07-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS639130U true JPS639130U (en) | 1988-01-21 |
Family
ID=30974164
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10248186U Pending JPS639130U (en) | 1986-07-02 | 1986-07-02 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS639130U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0290845U (en) * | 1988-12-30 | 1990-07-18 | ||
| US11730281B2 (en) | 2019-02-01 | 2023-08-22 | Ts Tech Co., Ltd. | Vehicle seat |
-
1986
- 1986-07-02 JP JP10248186U patent/JPS639130U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0290845U (en) * | 1988-12-30 | 1990-07-18 | ||
| US11730281B2 (en) | 2019-02-01 | 2023-08-22 | Ts Tech Co., Ltd. | Vehicle seat |
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