JPH02132933U - - Google Patents
Info
- Publication number
- JPH02132933U JPH02132933U JP4163689U JP4163689U JPH02132933U JP H02132933 U JPH02132933 U JP H02132933U JP 4163689 U JP4163689 U JP 4163689U JP 4163689 U JP4163689 U JP 4163689U JP H02132933 U JPH02132933 U JP H02132933U
- Authority
- JP
- Japan
- Prior art keywords
- resist
- substrate
- spin chuck
- cleaning
- spin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004140 cleaning Methods 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 239000007788 liquid Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 238000005406 washing Methods 0.000 claims 1
- 238000007789 sealing Methods 0.000 description 1
Landscapes
- Coating Apparatus (AREA)
Description
第1図は、本考案のスピンチヤツク洗浄機能付
きレジスト塗布装置の断面側面図である。
1……塗布カツプ、2……密閉カツプ、3……
密閉カツプ支持部、4……洗浄ノズル、5……レ
ジスト塗布ノズル、6……スピンチヤツク、10
……基板吸着面、12……チヤツク洗浄ブラシ、
13……ブラシ回転モータ、14……ブラシアー
ム、15……アーム移動モータ。
FIG. 1 is a sectional side view of a resist coating apparatus with a spin chuck cleaning function according to the present invention. 1...Applying cup, 2...Sealing cup, 3...
Sealed cup support part, 4...Cleaning nozzle, 5...Resist coating nozzle, 6...Spin chuck, 10
...Substrate suction surface, 12...Chuck cleaning brush,
13... Brush rotation motor, 14... Brush arm, 15... Arm moving motor.
Claims (1)
において、基板固定支持用スピンチヤツクの表面
に移動可能なチヤツク洗浄ブラシと洗浄液供給用
洗浄ノズルとを設け、レジストを塗布した基板の
搬出後に、スピンチヤツク表面に付着したレジス
トを洗浄するようにしたことを特徴とするスピン
チヤツク洗浄機能付きレジスト塗布装置。 In an apparatus that applies resist to a substrate using a spin method, a movable chuck cleaning brush and a cleaning nozzle for supplying cleaning liquid are provided on the surface of a spin chuck for fixing and supporting the substrate, and after the resist coated substrate is carried out, the resist adheres to the surface of the spin chuck. 1. A resist coating device with a spin chuck cleaning function, characterized in that the resist is cleaned after washing.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989041636U JPH0713211Y2 (en) | 1989-04-11 | 1989-04-11 | Resist coater with spin chuck cleaning function |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1989041636U JPH0713211Y2 (en) | 1989-04-11 | 1989-04-11 | Resist coater with spin chuck cleaning function |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02132933U true JPH02132933U (en) | 1990-11-05 |
JPH0713211Y2 JPH0713211Y2 (en) | 1995-03-29 |
Family
ID=31552475
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1989041636U Expired - Lifetime JPH0713211Y2 (en) | 1989-04-11 | 1989-04-11 | Resist coater with spin chuck cleaning function |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0713211Y2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006066447A (en) * | 2004-08-24 | 2006-03-09 | Komatsu Electronic Metals Co Ltd | Work chuck cleaning apparatus, work chuck cleaning method, and polishing equipment equipped with the work chuck cleaning apparatus |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4863709A (en) * | 1971-11-20 | 1973-09-04 |
-
1989
- 1989-04-11 JP JP1989041636U patent/JPH0713211Y2/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4863709A (en) * | 1971-11-20 | 1973-09-04 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006066447A (en) * | 2004-08-24 | 2006-03-09 | Komatsu Electronic Metals Co Ltd | Work chuck cleaning apparatus, work chuck cleaning method, and polishing equipment equipped with the work chuck cleaning apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPH0713211Y2 (en) | 1995-03-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |