JPS6112653U - Bakyu whip - Google Patents

Bakyu whip

Info

Publication number
JPS6112653U
JPS6112653U JP9467384U JP9467384U JPS6112653U JP S6112653 U JPS6112653 U JP S6112653U JP 9467384 U JP9467384 U JP 9467384U JP 9467384 U JP9467384 U JP 9467384U JP S6112653 U JPS6112653 U JP S6112653U
Authority
JP
Japan
Prior art keywords
bakyu
whip
vacuum chuck
substrate
placing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9467384U
Other languages
Japanese (ja)
Inventor
強 田中
Original Assignee
日本電気株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本電気株式会社 filed Critical 日本電気株式会社
Priority to JP9467384U priority Critical patent/JPS6112653U/en
Publication of JPS6112653U publication Critical patent/JPS6112653U/en
Pending legal-status Critical Current

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  • Jigs For Machine Tools (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図Aは従来のバキュームチャックを用いたレジスト
塗布装置の断面図であり、第1図Bは第1図Aの上面図
である。 第2図は本考案の実施例の断面図である。 尚図において、1・・・・・・モータ、2・・・・・・
モータスピンドル、3・・・・・・バキューム面、4・
・・・・・バキュームチャック軸、5・・・・・・メタ
ルマススク基板、6・・・・・・バキュームバルブ、7
・・曲レジストノズル、8・・・・・・カップ、9・・
・・・・エアー吹き出し口、10・・・・・・エアー。
FIG. 1A is a sectional view of a conventional resist coating apparatus using a vacuum chuck, and FIG. 1B is a top view of FIG. 1A. FIG. 2 is a sectional view of an embodiment of the present invention. In the figure, 1...motor, 2...
Motor spindle, 3... Vacuum surface, 4.
...Vacuum chuck shaft, 5...Metal mask board, 6...Vacuum valve, 7
...Track registration nozzle, 8...Cup, 9...
...Air outlet, 10...Air.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 基板を栽置するバキュームチャックにおいて、回転中に
該基板の裏面にエアーを吹きつける機能が設けられてい
ることを特徴とするバキュームチャック。
A vacuum chuck for placing a substrate, characterized in that the vacuum chuck is provided with a function of blowing air onto the back surface of the substrate during rotation.
JP9467384U 1984-06-25 1984-06-25 Bakyu whip Pending JPS6112653U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9467384U JPS6112653U (en) 1984-06-25 1984-06-25 Bakyu whip

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9467384U JPS6112653U (en) 1984-06-25 1984-06-25 Bakyu whip

Publications (1)

Publication Number Publication Date
JPS6112653U true JPS6112653U (en) 1986-01-24

Family

ID=30653367

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9467384U Pending JPS6112653U (en) 1984-06-25 1984-06-25 Bakyu whip

Country Status (1)

Country Link
JP (1) JPS6112653U (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0268425U (en) * 1988-11-14 1990-05-24
JP2023093567A (en) * 2020-07-07 2023-07-04 ラム リサーチ コーポレーション Integrated dry processes for patterning radiation photoresist patterning
US11921427B2 (en) 2018-11-14 2024-03-05 Lam Research Corporation Methods for making hard masks useful in next-generation lithography
US11988965B2 (en) 2020-01-15 2024-05-21 Lam Research Corporation Underlayer for photoresist adhesion and dose reduction

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0268425U (en) * 1988-11-14 1990-05-24
US11921427B2 (en) 2018-11-14 2024-03-05 Lam Research Corporation Methods for making hard masks useful in next-generation lithography
US11988965B2 (en) 2020-01-15 2024-05-21 Lam Research Corporation Underlayer for photoresist adhesion and dose reduction
JP2023093567A (en) * 2020-07-07 2023-07-04 ラム リサーチ コーポレーション Integrated dry processes for patterning radiation photoresist patterning

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