JPH0265333U - - Google Patents

Info

Publication number
JPH0265333U
JPH0265333U JP14489288U JP14489288U JPH0265333U JP H0265333 U JPH0265333 U JP H0265333U JP 14489288 U JP14489288 U JP 14489288U JP 14489288 U JP14489288 U JP 14489288U JP H0265333 U JPH0265333 U JP H0265333U
Authority
JP
Japan
Prior art keywords
wafer
resist coating
coating apparatus
chuck
rotating shaft
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14489288U
Other languages
Japanese (ja)
Other versions
JPH0632673Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP14489288U priority Critical patent/JPH0632673Y2/en
Publication of JPH0265333U publication Critical patent/JPH0265333U/ja
Application granted granted Critical
Publication of JPH0632673Y2 publication Critical patent/JPH0632673Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Coating Apparatus (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第１図は本考案の実施例を示す図、第２図は本
考案の実施例の作用を説明するための図、第３図
は従来のレジスト塗布装置を示す図、第４図は従
来のレジスト塗布装置でウエハー上に塗布したレ
ジストの形状を示す図である。 図において、１０はチヤツク、１０ａは吸着面
、１１は真空吸引用の孔、１２は回転軸、１３は
段差部、１４はウエハー、１５はレジスト、１６
はオリエンテーシヨンフラツトを示す。 Fig. 1 is a diagram showing an embodiment of the present invention, Fig. 2 is a diagram for explaining the operation of the embodiment of the present invention, Fig. 3 is a diagram showing a conventional resist coating device, and Fig. 4 is a diagram showing a conventional resist coating device. FIG. 3 is a diagram showing the shape of a resist coated on a wafer by a resist coating device. In the figure, 10 is a chuck, 10a is a suction surface, 11 is a hole for vacuum suction, 12 is a rotating shaft, 13 is a stepped portion, 14 is a wafer, 15 is a resist, 16
indicates an orientation flat.

Claims (1)

【実用新案登録請求の範囲】 真空によりウエハー１４を吸着保持し、その吸
着面に対し垂直に設けられた回転軸１２により回
転するチヤツク１０を少なくとも具備したレジス
ト塗布装置において、 上記チヤツク１０にウエハー１４のオリエンテ
ーシヨンフラツト１６に当接し、且つウエハー１
４の厚さと等しい高さの段差部１３を設けたこと
を特徴とするレジスト塗布装置。[Scope of Claim for Utility Model Registration] A resist coating apparatus comprising at least a chuck 10 which attracts and holds a wafer 14 using a vacuum and rotates by a rotating shaft 12 provided perpendicularly to the suction surface of the resist coating apparatus. The wafer 1 is in contact with the orientation flat 16 of the wafer 1.
4. A resist coating device characterized in that a step portion 13 having a height equal to the thickness of No. 4 is provided.
JP14489288U 1988-11-08 1988-11-08 Resist coating device Expired - Lifetime JPH0632673Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14489288U JPH0632673Y2 (en) 1988-11-08 1988-11-08 Resist coating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14489288U JPH0632673Y2 (en) 1988-11-08 1988-11-08 Resist coating device

Publications (2)

Publication Number Publication Date
JPH0265333U true JPH0265333U (en) 1990-05-16
JPH0632673Y2 JPH0632673Y2 (en) 1994-08-24

Family

ID=31413000

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14489288U Expired - Lifetime JPH0632673Y2 (en) 1988-11-08 1988-11-08 Resist coating device

Country Status (1)

Country Link
JP (1) JPH0632673Y2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05283511A (en) * 1992-03-31 1993-10-29 Nippon Telegr & Teleph Corp <Ntt> Vacuum suction device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05283511A (en) * 1992-03-31 1993-10-29 Nippon Telegr & Teleph Corp <Ntt> Vacuum suction device

Also Published As

Publication number Publication date
JPH0632673Y2 (en) 1994-08-24

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