JPS62126829U

JPS62126829U -

Info

Publication number: JPS62126829U
Application number: JP1295186U
Authority: JP
Priority date: 1986-01-31
Filing date: 1986-01-31
Publication date: 1987-08-12

Description

[Brief explanation of drawings]

第１図は本考案の第一実施例を示す基板保持部
の平面図、第２図は第１図―線断面図、第３
図は本考案の第２実施例を示す基板保持部の平面
図、第４図は本考案の第３実施例を示す基板保持
部の要部平面図、第５図は第４図―線拡大断
面図、第６図は本考案の第４実施例を示す基板保
持部の要部断面図、第７図は第６図―線拡大
断面図、第８図は回転塗布装置の概略構成図、第
９図ａ，ｂは従来の基板保持部の平面図および断
面図、第１０図は基板裏面に付着したレジストの
糸状物を示す平面図である。１…レジスト液、４…基板、５…基板保持部、
１５…環状突起部、１６…基台、１８…軸受部、
１９…真空吸着用穴、３０…基板保持面、３１，
３１ａ〜３１ｄ…凹陥部。 FIG. 1 is a plan view of a substrate holder showing the first embodiment of the present invention, FIG. 2 is a sectional view taken along the line of FIG.
The figure is a plan view of the substrate holder showing the second embodiment of the present invention, Figure 4 is a plan view of the main part of the substrate holder showing the third embodiment of the present invention, and Figure 5 is the enlarged line of Figure 4. 6 is a sectional view of a main part of a substrate holding part showing a fourth embodiment of the present invention, FIG. 7 is an enlarged sectional view taken along the line of FIG. 6, and FIG. 8 is a schematic configuration diagram of a spin coating device. 9a and 9b are a plan view and a cross-sectional view of a conventional substrate holder, and FIG. 10 is a plan view showing filaments of resist attached to the back surface of the substrate. 1... Resist liquid, 4... Substrate, 5... Substrate holding part,
15... Annular projection part, 16... Base, 18... Bearing part,
19...Vacuum suction hole, 30...Substrate holding surface, 31,
31a to 31d...Concave portions.

Claims

[Scope of utility model registration request]

In a rotary coating apparatus that includes a substrate holder that rotates while holding a polygonal substrate, and forms a resist film on one main surface of the substrate by supplying a resist solution, the substrate holder has a diameter or a diagonal of the substrate holder. has a substrate holding surface whose length is larger than the diagonal dimension of the main surface of the substrate, and of this substrate holding surface,
A rotary coating device, characterized in that a recessed portion is provided in a portion corresponding to the vicinity of the end portion on the rotation direction side of the side surface of the substrate.