JPS61162859U - - Google Patents
Info
- Publication number
- JPS61162859U JPS61162859U JP4493285U JP4493285U JPS61162859U JP S61162859 U JPS61162859 U JP S61162859U JP 4493285 U JP4493285 U JP 4493285U JP 4493285 U JP4493285 U JP 4493285U JP S61162859 U JPS61162859 U JP S61162859U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- resist
- spin chuck
- spin
- rotating shaft
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 230000002265 prevention Effects 0.000 claims description 2
- 238000004528 spin coating Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
Landscapes
- Coating Apparatus (AREA)
Description
第１図は本考案の一実施例を説明するレジスト
塗布装置の構成図、第２図は従来のレジスト塗布
装置の構成図、第３図はウエハ裏面のレジスト汚
れの様子を示す説明図、第４〜第６図は本考案の
効果の説明線図である。
２…ウエハ、３…スピンチヤツク、１１…レジ
スト付着防止板、１２…回転軸。
FIG. 1 is a block diagram of a resist coating apparatus explaining an embodiment of the present invention, FIG. 2 is a block diagram of a conventional resist coating apparatus, FIG. 4 to 6 are explanatory diagrams of the effects of the present invention. 2... Wafer, 3... Spin chuck, 11... Resist adhesion prevention plate, 12... Rotating shaft.
Claims (1)
を塗布する方法において、ウエハのスピンチヤツ
ク部以外のウエハ裏面を被覆するレジスト付着防
止板をウエハと同時回転する回転軸に取付けたこ
とを特徴とするレジストスピン塗布装置。 A resist spin coating device in which a wafer is fixed to a spin chuck and a resist is applied to the wafer, characterized in that a resist adhesion prevention plate for coating the back surface of the wafer other than the spin chuck portion is attached to a rotating shaft that rotates simultaneously with the wafer. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4493285U JPS61162859U (en) | 1985-03-29 | 1985-03-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4493285U JPS61162859U (en) | 1985-03-29 | 1985-03-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61162859U true JPS61162859U (en) | 1986-10-08 |
Family
ID=30557965
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4493285U Pending JPS61162859U (en) | 1985-03-29 | 1985-03-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61162859U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS636843A (en) * | 1986-06-26 | 1988-01-12 | Dainippon Screen Mfg Co Ltd | Substrate surface treatment |
-
1985
- 1985-03-29 JP JP4493285U patent/JPS61162859U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS636843A (en) * | 1986-06-26 | 1988-01-12 | Dainippon Screen Mfg Co Ltd | Substrate surface treatment |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0318658U (en) | ||
| JPS61162859U (en) | ||
| JPS6295867U (en) | ||
| JPH02118926U (en) | ||
| JPH02104984U (en) | ||
| JPH0378507U (en) | ||
| JPS60136799U (en) | Rotating disc body of rotating aeration equipment | |
| JPH03119738U (en) | ||
| JPS6230336U (en) | ||
| JPS60131350U (en) | Molded plate polishing equipment | |
| JPS60193552U (en) | resist developing device | |
| JPH0265333U (en) | ||
| JPS59190365U (en) | Coating equipment | |
| JPS6355166U (en) | ||
| JPH01166198U (en) | ||
| JPS6073546U (en) | Chemical injection device | |
| JPS6347410U (en) | ||
| JPH0176046U (en) | ||
| JPS5894939U (en) | damper device | |
| JPS5839894U (en) | Blackboard days of the week, rotating device | |
| JPS6139248U (en) | combustion device | |
| JPS6084251U (en) | Planetary rotary polishing device | |
| JPS61108921U (en) | ||
| JPS6075767U (en) | ball valve | |
| JPS61182986U (en) |