JPS62120341U - - Google Patents
Info
- Publication number
- JPS62120341U JPS62120341U JP670286U JP670286U JPS62120341U JP S62120341 U JPS62120341 U JP S62120341U JP 670286 U JP670286 U JP 670286U JP 670286 U JP670286 U JP 670286U JP S62120341 U JPS62120341 U JP S62120341U
- Authority
- JP
- Japan
- Prior art keywords
- chuck
- semiconductor wafer
- saucer
- tank
- processing apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims 2
- 238000007599 discharging Methods 0.000 claims 1
Landscapes
- Coating Apparatus (AREA)
- Weting (AREA)
Description
第１図および第２図は本考案に係るスピン処理
装置を示す平面図と断面図、第３図は従来のスピ
ン処理装置を示す平面図である。
１……半導体ウエハ、２……カツプ、３……ノ
ズル、１１……スピンチヤツク、１２……受皿。
1 and 2 are a plan view and a sectional view showing a spin processing apparatus according to the present invention, and FIG. 3 is a plan view showing a conventional spin processing apparatus. 1...Semiconductor wafer, 2...Cup, 3...Nozzle, 11...Spin chuck, 12...Saucer.
Claims (1)
吸着保持するチヤツクと、このチヤツクの上方に
設けられ前記半導体ウエハ上に処理液を噴射する
ノズルとを備えたスピン処理装置において、前記
ノズルと前記チヤツク上の半導体ウエハとの間に
処理液排出用のタンク内に連通する受皿を進退自
在に設けたことを特徴とするスピン処理装置。 A spin processing apparatus comprising: a chuck which is rotatably arranged in a processing tank and which sucks and holds a semiconductor wafer; and a nozzle which is provided above the chuck and which injects a processing liquid onto the semiconductor wafer. A spin processing apparatus characterized in that a saucer communicating with a tank for discharging processing liquid is provided between a semiconductor wafer on a chuck and a saucer that can move forward and backward.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP670286U JPS62120341U (en) | 1986-01-21 | 1986-01-21 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP670286U JPS62120341U (en) | 1986-01-21 | 1986-01-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62120341U true JPS62120341U (en) | 1987-07-30 |
Family
ID=30789463
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP670286U Pending JPS62120341U (en) | 1986-01-21 | 1986-01-21 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62120341U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11128813A (en) * | 1997-10-31 | 1999-05-18 | Tokyo Electron Ltd | Coating method and coater |
-
1986
- 1986-01-21 JP JP670286U patent/JPS62120341U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11128813A (en) * | 1997-10-31 | 1999-05-18 | Tokyo Electron Ltd | Coating method and coater |