JPS63162528U - - Google Patents
Info
- Publication number
- JPS63162528U JPS63162528U JP5514787U JP5514787U JPS63162528U JP S63162528 U JPS63162528 U JP S63162528U JP 5514787 U JP5514787 U JP 5514787U JP 5514787 U JP5514787 U JP 5514787U JP S63162528 U JPS63162528 U JP S63162528U
- Authority
- JP
- Japan
- Prior art keywords
- stage
- liquid processing
- wafer
- supported
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 claims description 11
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Weting (AREA)
Description
第１図は本考案の液処理装置に使用されるステ
ージの一実施例の斜視図、第２図は上記ステージ
を用いた本考案の液処理装置の要部の一部断面図
、第３図は他の実施例におけるステージを用いた
本考案の液処理装置の要部の一部断面図、第４図
ａ，ｂはそれぞれ処理液の流動によるウエハの状
態を示した図、第５図は従来の液処理装置の要部
の一部断面図、第６図は従来の処理液の流動によ
るウエハの状態を示した図である。
１……液処理装置、１０……キヤリヤ、１１…
…ウエハ、１２，１２′……ステージ、１４……
液槽。
FIG. 1 is a perspective view of an embodiment of the stage used in the liquid processing apparatus of the present invention, FIG. 2 is a partial cross-sectional view of a main part of the liquid processing apparatus of the present invention using the above stage, and FIG. 3 4 is a partial cross-sectional view of the main part of the liquid processing apparatus of the present invention using a stage in another embodiment, FIGS. FIG. 6 is a partial cross-sectional view of a main part of a conventional liquid processing apparatus, and is a diagram showing the state of a wafer due to the flow of a conventional processing liquid. 1...liquid processing device, 10...carrier, 11...
...Wafer, 12, 12'...Stage, 14...
liquid tank.
Claims (1)
せて、該ステージを液槽内で上下動させてウエハ
に液処理を施す液処理装置において、 上記キヤリヤを傾斜姿勢でステージに支持させ
たことを特徴とする液処理装置。[Scope of Claim for Utility Model Registration] A liquid processing apparatus in which a carrier carrying a wafer is supported on a stage and the stage is moved up and down in a liquid bath to perform liquid processing on the wafer, wherein the carrier is placed on the stage in an inclined position. A liquid processing device characterized in that it is supported.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987055147U JPH051075Y2 (en) | 1987-04-10 | 1987-04-10 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987055147U JPH051075Y2 (en) | 1987-04-10 | 1987-04-10 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63162528U true JPS63162528U (en) | 1988-10-24 |
| JPH051075Y2 JPH051075Y2 (en) | 1993-01-12 |
Family
ID=30882788
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987055147U Expired - Lifetime JPH051075Y2 (en) | 1987-04-10 | 1987-04-10 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH051075Y2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005005339A (en) * | 2003-06-10 | 2005-01-06 | Tokyo Ohka Kogyo Co Ltd | Developing apparatus of substrate |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5887832A (en) * | 1981-11-20 | 1983-05-25 | Toshiba Corp | Semiconductor treating device |
-
1987
- 1987-04-10 JP JP1987055147U patent/JPH051075Y2/ja not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5887832A (en) * | 1981-11-20 | 1983-05-25 | Toshiba Corp | Semiconductor treating device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005005339A (en) * | 2003-06-10 | 2005-01-06 | Tokyo Ohka Kogyo Co Ltd | Developing apparatus of substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH051075Y2 (en) | 1993-01-12 |