JPS6364032U - - Google Patents

Info

Publication number
JPS6364032U
JPS6364032U JP15853286U JP15853286U JPS6364032U JP S6364032 U JPS6364032 U JP S6364032U JP 15853286 U JP15853286 U JP 15853286U JP 15853286 U JP15853286 U JP 15853286U JP S6364032 U JPS6364032 U JP S6364032U
Authority
JP
Japan
Prior art keywords
cleaning
developer
developing device
liquid tank
photoresist film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15853286U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP15853286U priority Critical patent/JPS6364032U/ja
Publication of JPS6364032U publication Critical patent/JPS6364032U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本考案に係る現像装置の一実施例を
示す概略側面図、第2図は、従来の現像装置の一
例を示す概略側面図である。 W……半導体ウエーハ、10……液槽、12…
…ターンテーブル。
FIG. 1 is a schematic side view showing an embodiment of a developing device according to the present invention, and FIG. 2 is a schematic side view showing an example of a conventional developing device. W...Semiconductor wafer, 10...Liquid tank, 12...
…Turntable.

Claims (1)

【実用新案登録請求の範囲】 半導体ウエーハ表面のフオトレジスト膜の現像
装置であつて、 現像液あるいは洗浄液が供給される液槽と、 上記液槽の上方に配設され、上記半導体ウエー
ハをフオトレジスト膜を下方に向けた状態で保持
するターンテーブルとからなり、 上記フオトレジスト膜を液槽の現像液あるいは
洗浄液の略液面で現像あるいは洗浄処理すること
を特徴とする現像装置。
[Scope of Claim for Utility Model Registration] A developing device for a photoresist film on the surface of a semiconductor wafer, comprising: a liquid tank to which a developer or a cleaning liquid is supplied; A developing device comprising a turntable that holds the film facing downward, and developing or cleaning the photoresist film at substantially the level of a developer or cleaning solution in a liquid tank.
JP15853286U 1986-10-15 1986-10-15 Pending JPS6364032U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15853286U JPS6364032U (en) 1986-10-15 1986-10-15

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15853286U JPS6364032U (en) 1986-10-15 1986-10-15

Publications (1)

Publication Number Publication Date
JPS6364032U true JPS6364032U (en) 1988-04-27

Family

ID=31082109

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15853286U Pending JPS6364032U (en) 1986-10-15 1986-10-15

Country Status (1)

Country Link
JP (1) JPS6364032U (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5655048A (en) * 1979-10-11 1981-05-15 Matsushita Electric Ind Co Ltd Developing method and device therefor
JPS62102534A (en) * 1985-10-29 1987-05-13 Kurotani Nobuko Processor for semiconductor material
JPS62269316A (en) * 1986-05-19 1987-11-21 Kurotani Iwao Processor for develoment of semiconductor material

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5655048A (en) * 1979-10-11 1981-05-15 Matsushita Electric Ind Co Ltd Developing method and device therefor
JPS62102534A (en) * 1985-10-29 1987-05-13 Kurotani Nobuko Processor for semiconductor material
JPS62269316A (en) * 1986-05-19 1987-11-21 Kurotani Iwao Processor for develoment of semiconductor material

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