JPS62190338U - - Google Patents

Info

Publication number
JPS62190338U
JPS62190338U JP7878886U JP7878886U JPS62190338U JP S62190338 U JPS62190338 U JP S62190338U JP 7878886 U JP7878886 U JP 7878886U JP 7878886 U JP7878886 U JP 7878886U JP S62190338 U JPS62190338 U JP S62190338U
Authority
JP
Japan
Prior art keywords
nozzle
semiconductor wafer
resist solution
tip
dropping
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7878886U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP7878886U priority Critical patent/JPS62190338U/ja
Publication of JPS62190338U publication Critical patent/JPS62190338U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Weting (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案のデイスペンスノズルを説明す
る断面図であり、第2図は第1図のデイスペンス
ノズルの作用を説明する断面図である。第3図は
従来の成膜装置を説明する一部断面図であり、第
4図はデイスペンスノズルの断面図である。 1……半導体ウエハ、3……レジスト液、4A
……デイスペンスノズル、6……ノズル部、7…
…カバー、8……先端。
FIG. 1 is a sectional view illustrating the dispense nozzle of the present invention, and FIG. 2 is a sectional view illustrating the operation of the dispense nozzle of FIG. 1. FIG. 3 is a partial sectional view illustrating a conventional film forming apparatus, and FIG. 4 is a sectional view of a dispense nozzle. 1...Semiconductor wafer, 3...Resist liquid, 4A
... Dispense nozzle, 6 ... Nozzle part, 7 ...
...Cover, 8...Tip.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 半導体ウエハにレジスト液を滴下するデイスペ
ンスノズルにおいて、前記レジスト液を吐出する
ノズル先端を囲みこの先端よりも前記半導体ウエ
ハ側に突出する筒状のカバーが設けられているこ
とを特徴とするデイスペンスノズル。
A dispense nozzle for dropping a resist solution onto a semiconductor wafer, characterized in that a cylindrical cover is provided that surrounds a tip of the nozzle that discharges the resist solution and projects from the tip toward the semiconductor wafer. nozzle.
JP7878886U 1986-05-27 1986-05-27 Pending JPS62190338U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7878886U JPS62190338U (en) 1986-05-27 1986-05-27

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7878886U JPS62190338U (en) 1986-05-27 1986-05-27

Publications (1)

Publication Number Publication Date
JPS62190338U true JPS62190338U (en) 1987-12-03

Family

ID=30928048

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7878886U Pending JPS62190338U (en) 1986-05-27 1986-05-27

Country Status (1)

Country Link
JP (1) JPS62190338U (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5081067A (en) * 1973-11-16 1975-07-01
JPS528383U (en) * 1975-07-02 1977-01-20
JPS6122627A (en) * 1984-07-10 1986-01-31 Mitsubishi Electric Corp Photo-sensitive resin coating nozzle

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5081067A (en) * 1973-11-16 1975-07-01
JPS528383U (en) * 1975-07-02 1977-01-20
JPS6122627A (en) * 1984-07-10 1986-01-31 Mitsubishi Electric Corp Photo-sensitive resin coating nozzle

Similar Documents

Publication Publication Date Title
JPS62190338U (en)
JPS62101230U (en)
JPS6426836U (en)
JPH0334064U (en)
JPS62183516U (en)
JPS62199179U (en)
JPS61130382U (en)
JPS63140623U (en)
JPS6422110U (en)
JPH0199481U (en)
JPH0299970U (en)
JPH01169025U (en)
JPS63201628U (en)
JPS6373351U (en)
JPS5911438U (en) Diffusion source coating liquid dripping nozzle
JPH0273729U (en)
JPS639129U (en)
JPH0177891U (en)
JPS6329931U (en)
JPS63185225U (en)
JPH0227724U (en)
JPH0425146U (en)
JPH0327040U (en)
JPH0453405U (en)
JPH02125327U (en)