JPS58128441U - developing device - Google Patents

developing device

Info

Publication number
JPS58128441U
JPS58128441U JP2511382U JP2511382U JPS58128441U JP S58128441 U JPS58128441 U JP S58128441U JP 2511382 U JP2511382 U JP 2511382U JP 2511382 U JP2511382 U JP 2511382U JP S58128441 U JPS58128441 U JP S58128441U
Authority
JP
Japan
Prior art keywords
wafer
developing device
developer
heat insulator
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2511382U
Other languages
Japanese (ja)
Inventor
石芳　敏精
Original Assignee
富士通株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士通株式会社 filed Critical 富士通株式会社
Priority to JP2511382U priority Critical patent/JPS58128441U/en
Publication of JPS58128441U publication Critical patent/JPS58128441U/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第１図は従来の現像装置を示す図、第２図は本考案の一
実施例である現像装置の構成を説明するための図である
。図において１，１１はチャンバー、２，１２は現像液
用ノズル、３．１３は洗浄用ノズル、４．１４は真空チ
ャック、５．１５はウェハ、８．１８は排液口、９は保
温器、１０は、　温調機、１９は液面、２０はポンプを
示す。FIG. 1 is a diagram showing a conventional developing device, and FIG. 2 is a diagram for explaining the configuration of a developing device that is an embodiment of the present invention. In the figure, 1 and 11 are chambers, 2 and 12 are developer nozzles, 3.13 are cleaning nozzles, 4.14 are vacuum chucks, 5.15 are wafers, 8.18 are drain ports, and 9 is a heat insulator. , 10 is a temperature controller, 19 is a liquid level, and 20 is a pump.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 表面にレジスト膜を塗布したウェハをチャンバ内に設置
し、現像液を供給して所定のパターンを再生する現像処
置において、温調機により一定温度に制御される保温器
を設け、該保温器内に備えた螺旋状をなすガラス管に前
記現像液を通過させて保温させると共に前記ウェハ周辺
部を一定温度で保温させる温度機構としたことを特徴と
する現像装置。In the development process, in which a wafer with a resist film coated on its surface is placed in a chamber and a developer is supplied to reproduce a predetermined pattern, a heat insulator is provided that is controlled at a constant temperature by a temperature controller, and the inside of the heat insulator is 1. A developing device characterized by having a temperature mechanism that allows the developer to pass through a spiral glass tube provided in the wafer to keep it warm, and also keeps the peripheral area of the wafer at a constant temperature.
JP2511382U 1982-02-24 1982-02-24 developing device Pending JPS58128441U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2511382U JPS58128441U (en) 1982-02-24 1982-02-24 developing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2511382U JPS58128441U (en) 1982-02-24 1982-02-24 developing device

Publications (1)

Publication Number Publication Date
JPS58128441U true JPS58128441U (en) 1983-08-31

Family

ID=30037086

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2511382U Pending JPS58128441U (en) 1982-02-24 1982-02-24 developing device

Country Status (1)

Country Link
JP (1) JPS58128441U (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6083240U (en) * 1983-11-15 1985-06-08 富士通株式会社 spin developing machine
JPS6178123A (en) * 1984-09-26 1986-04-21 Dainippon Screen Mfg Co Ltd Process and device of processing substrate surface
JPS61251135A (en) * 1985-04-30 1986-11-08 Toshiba Corp Automatic developing apparatus
JPH0286826A (en) * 1989-07-07 1990-03-27 Hitachi Ltd Liquid treating device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6083240U (en) * 1983-11-15 1985-06-08 富士通株式会社 spin developing machine
JPS6178123A (en) * 1984-09-26 1986-04-21 Dainippon Screen Mfg Co Ltd Process and device of processing substrate surface
JPS61251135A (en) * 1985-04-30 1986-11-08 Toshiba Corp Automatic developing apparatus
JPH0286826A (en) * 1989-07-07 1990-03-27 Hitachi Ltd Liquid treating device

Similar Documents

Publication Publication Date Title
JPS58128441U (en) developing device
JPS61214520A (en) Coating device
JPS61104621A (en) Positive-photoresist developing apparatus
JPS59132634U (en) semiconductor manufacturing equipment
JPS58162145U (en) Automatic film developing device
JPS5887336U (en) Etching device
JPS58138939U (en) Automatic film developing device
JPS6083240U (en) spin developing machine
JPS6364032U (en)
JPS606147U (en) Development processing equipment
JPS58192944U (en) Film forming equipment for amorphous silicon photoreceptor
JPS58159737U (en) Semiconductor substrate etching equipment
JPS5912867U (en) Photoreceptor manufacturing equipment for electrophotography
JPS606149U (en) semiconductor exposure equipment
JPS59124727A (en) Spin processing apparatus
JPS59131151U (en) Parallel plate type dry etching equipment
JPS59187140U (en) semiconductor exposure equipment
JPS5929847U (en) Evaporative cooling dummy boiler
JPS5828840U (en) Diazo dry developing device
JPS5834955U (en) Vacuum deposition equipment
JPS58128930U (en) Film forming equipment
JPS5912151U (en) automatic developing device
JPS60168147U (en) image forming device
JPH02142523U (en)
JPS62219620A (en) Method for development of resist