JPS58128441U - developing device - Google Patents
developing deviceInfo
- Publication number
- JPS58128441U JPS58128441U JP2511382U JP2511382U JPS58128441U JP S58128441 U JPS58128441 U JP S58128441U JP 2511382 U JP2511382 U JP 2511382U JP 2511382 U JP2511382 U JP 2511382U JP S58128441 U JPS58128441 U JP S58128441U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- developing device
- developer
- heat insulator
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Silver Salt Photography Or Processing Solution Therefor (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図は従来の現像装置を示す図、第2図は本考案の一
実施例である現像装置の構成を説明するための図である
。図において1,11はチャンバー、2,12は現像液
用ノズル、3.13は洗浄用ノズル、4.14は真空チ
ャック、5.15はウェハ、8.18は排液口、9は保
温器、10は、 温調機、19は液面、20はポンプを
示す。FIG. 1 is a diagram showing a conventional developing device, and FIG. 2 is a diagram for explaining the configuration of a developing device that is an embodiment of the present invention. In the figure, 1 and 11 are chambers, 2 and 12 are developer nozzles, 3.13 are cleaning nozzles, 4.14 are vacuum chucks, 5.15 are wafers, 8.18 are drain ports, and 9 is a heat insulator. , 10 is a temperature controller, 19 is a liquid level, and 20 is a pump.
Claims (1)
し、現像液を供給して所定のパターンを再生する現像処
置において、温調機により一定温度に制御される保温器
を設け、該保温器内に備えた螺旋状をなすガラス管に前
記現像液を通過させて保温させると共に前記ウェハ周辺
部を一定温度で保温させる温度機構としたことを特徴と
する現像装置。In the development process, in which a wafer with a resist film coated on its surface is placed in a chamber and a developer is supplied to reproduce a predetermined pattern, a heat insulator is provided that is controlled at a constant temperature by a temperature controller, and the inside of the heat insulator is 1. A developing device characterized by having a temperature mechanism that allows the developer to pass through a spiral glass tube provided in the wafer to keep it warm, and also keeps the peripheral area of the wafer at a constant temperature.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2511382U JPS58128441U (en) | 1982-02-24 | 1982-02-24 | developing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2511382U JPS58128441U (en) | 1982-02-24 | 1982-02-24 | developing device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS58128441U true JPS58128441U (en) | 1983-08-31 |
Family
ID=30037086
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2511382U Pending JPS58128441U (en) | 1982-02-24 | 1982-02-24 | developing device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58128441U (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6083240U (en) * | 1983-11-15 | 1985-06-08 | 富士通株式会社 | spin developing machine |
JPS6178123A (en) * | 1984-09-26 | 1986-04-21 | Dainippon Screen Mfg Co Ltd | Process and device of processing substrate surface |
JPS61251135A (en) * | 1985-04-30 | 1986-11-08 | Toshiba Corp | Automatic developing apparatus |
JPH0286826A (en) * | 1989-07-07 | 1990-03-27 | Hitachi Ltd | Liquid treating device |
-
1982
- 1982-02-24 JP JP2511382U patent/JPS58128441U/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6083240U (en) * | 1983-11-15 | 1985-06-08 | 富士通株式会社 | spin developing machine |
JPS6178123A (en) * | 1984-09-26 | 1986-04-21 | Dainippon Screen Mfg Co Ltd | Process and device of processing substrate surface |
JPS61251135A (en) * | 1985-04-30 | 1986-11-08 | Toshiba Corp | Automatic developing apparatus |
JPH0286826A (en) * | 1989-07-07 | 1990-03-27 | Hitachi Ltd | Liquid treating device |
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