JPS59187140U - semiconductor exposure equipment - Google Patents
semiconductor exposure equipmentInfo
- Publication number
- JPS59187140U JPS59187140U JP8282683U JP8282683U JPS59187140U JP S59187140 U JPS59187140 U JP S59187140U JP 8282683 U JP8282683 U JP 8282683U JP 8282683 U JP8282683 U JP 8282683U JP S59187140 U JPS59187140 U JP S59187140U
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor exposure
- exposure equipment
- stage
- semiconductor wafer
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図及び第２図は従来の半導体露光装置の各動作時の
断面図、第３図及び第４図は本考案の一実施例を示す各
動作時の要部断面図である。
１・・・半導体ウェーハ、７・・・マスク、１２・・・
ステージ、１５・・・マスクホルダ、１７・・・支点（
支持ピン）。1 and 2 are sectional views of a conventional semiconductor exposure apparatus during each operation, and FIGS. 3 and 4 are sectional views of essential parts of an embodiment of the present invention during each operation. 1... Semiconductor wafer, 7... Mask, 12...
Stage, 15...mask holder, 17... fulcrum (
support pin).
Claims (1)
マスクホルダで周縁部が支持された露光用マスクを密着
させて半導体ウェーハを選択露光する装置であって、前
記マスクホルダをその一端部を支点に前記ステージ上方
で上下揺動可能に設置したことを特徴とする半導体露光
装置。An apparatus for selectively exposing a semiconductor wafer by bringing an exposure mask, the peripheral edge of which is supported by a mask holder, into close contact with a semiconductor wafer vacuum-adsorbed on a stage; A semiconductor exposure device characterized by being installed above a stage so that it can swing up and down.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8282683U JPS59187140U (en) | 1983-05-30 | 1983-05-30 | semiconductor exposure equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8282683U JPS59187140U (en) | 1983-05-30 | 1983-05-30 | semiconductor exposure equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS59187140U true JPS59187140U (en) | 1984-12-12 |
Family
ID=30212784
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8282683U Pending JPS59187140U (en) | 1983-05-30 | 1983-05-30 | semiconductor exposure equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59187140U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002270486A (en) * | 2001-03-09 | 2002-09-20 | Orc Mfg Co Ltd | Substrate exposure apparatus and method of using the same |
-
1983
- 1983-05-30 JP JP8282683U patent/JPS59187140U/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002270486A (en) * | 2001-03-09 | 2002-09-20 | Orc Mfg Co Ltd | Substrate exposure apparatus and method of using the same |
| JP4594541B2 (en) * | 2001-03-09 | 2010-12-08 | 株式会社オーク製作所 | Substrate exposure apparatus and method of using the same |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS59187140U (en) | semiconductor exposure equipment | |
| JPS58135746U (en) | Wafer chuck for development | |
| JPS6041043U (en) | Sample holding mechanism for pattern defect inspection equipment | |
| JPS58166647U (en) | exposure equipment | |
| JPS5845533U (en) | Illuminance distribution measuring device | |
| JPS58105138U (en) | Automatic bonding equipment for semiconductor devices | |
| JPS60192436U (en) | Electron beam exposure equipment | |
| JPS60927U (en) | Semiconductor wafer pasting equipment | |
| JPS5933240U (en) | centrifugal dryer | |
| JPS6068635U (en) | semiconductor manufacturing equipment | |
| JPS58162639U (en) | Wafer holding mechanism for ion implantation equipment | |
| JPS606149U (en) | semiconductor exposure equipment | |
| JPS60100748U (en) | Photoresist coating equipment | |
| JPS6059212U (en) | microscope | |
| JPS63188938U (en) | ||
| JPS58158441U (en) | semiconductor etching equipment | |
| JPS58106938U (en) | Wafer holder for electron beam annealing | |
| JPS6072211U (en) | Semiconductor wafer scribing equipment | |
| JPS58118746U (en) | Uehachiyatsuk | |
| JPS5926239U (en) | reticle mounting base | |
| JPS58162638U (en) | Reel fixing jig for film carrier | |
| JPS6031996U (en) | Shape projection device for determining material removal | |
| JPS6373934U (en) | ||
| JPS59138231U (en) | alignment mark | |
| JPS60103142U (en) | Bernoulli type semiconductor substrate transfer equipment |