JPS58162639U - Wafer holding mechanism for ion implantation equipment - Google Patents

Wafer holding mechanism for ion implantation equipment

Info

Publication number
JPS58162639U
JPS58162639U JP5810582U JP5810582U JPS58162639U JP S58162639 U JPS58162639 U JP S58162639U JP 5810582 U JP5810582 U JP 5810582U JP 5810582 U JP5810582 U JP 5810582U JP S58162639 U JPS58162639 U JP S58162639U
Authority
JP
Japan
Prior art keywords
wafer
holding mechanism
ion implantation
wafer holding
implantation equipment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5810582U
Other languages
Japanese (ja)
Inventor
信一 古川
Original Assignee
日本電気株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本電気株式会社 filed Critical 日本電気株式会社
Priority to JP5810582U priority Critical patent/JPS58162639U/en
Publication of JPS58162639U publication Critical patent/JPS58162639U/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来のイオン注入装置用ウニハードリング機構
を示す全体図、第2図は従来のディスク板上に設置され
たウェハー保持機構を示す図、第3図は本願考案の一実
施例を示すウェハー保持機構分解図である。 なお図において、1・・・ディスク板(ウェハー着脱エ
リア)、2・・・ディスク板(ビーム打ち込みエリア)
、3・・・アーム、4・・・ウェハー保持機構、5・・
・固定棒、6・・・ウェハー、7・・・固定リング、訃
・・スプリング、9・・・スプリングシャフトである。
FIG. 1 is an overall view showing a conventional unihard ring mechanism for an ion implanter, FIG. 2 is a view showing a conventional wafer holding mechanism installed on a disk plate, and FIG. 3 is an illustration of an embodiment of the present invention. FIG. 3 is an exploded view of the wafer holding mechanism shown in FIG. In the figure, 1... Disc plate (wafer attachment/detachment area), 2... Disc plate (beam implantation area)
, 3... Arm, 4... Wafer holding mechanism, 5...
・Fixing rod, 6... Wafer, 7... Fixing ring, End... Spring, 9... Spring shaft.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] イオン注入装置におけるウェハーハンドリング機構のデ
ィスク板に設けられたウェハー保持機構において、ウェ
ハー全体を保持する固定リングと、リング固定棒と、ホ
ルダーを具備しそれぞれのリング固定棒はウェハー保持
機構とディスク板を貫通し裏面よりスプリングでウェハ
ーを保持した機構を有することにより、ウェハー保持を
自動的に行なうことを特徴とするイオン注入装置用ウェ
ハー保持機構。
A wafer holding mechanism installed on a disk plate of a wafer handling mechanism in an ion implantation apparatus includes a fixing ring that holds the entire wafer, a ring fixing rod, and a holder, and each ring fixing rod connects the wafer holding mechanism and the disk plate. A wafer holding mechanism for an ion implantation apparatus, characterized in that the wafer is automatically held by having a mechanism that extends through the wafer and holds the wafer from the back side with a spring.
JP5810582U 1982-04-21 1982-04-21 Wafer holding mechanism for ion implantation equipment Pending JPS58162639U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5810582U JPS58162639U (en) 1982-04-21 1982-04-21 Wafer holding mechanism for ion implantation equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5810582U JPS58162639U (en) 1982-04-21 1982-04-21 Wafer holding mechanism for ion implantation equipment

Publications (1)

Publication Number Publication Date
JPS58162639U true JPS58162639U (en) 1983-10-29

Family

ID=30068515

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5810582U Pending JPS58162639U (en) 1982-04-21 1982-04-21 Wafer holding mechanism for ion implantation equipment

Country Status (1)

Country Link
JP (1) JPS58162639U (en)

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