JPS61195050U - - Google Patents
Info
- Publication number
- JPS61195050U JPS61195050U JP7798385U JP7798385U JPS61195050U JP S61195050 U JPS61195050 U JP S61195050U JP 7798385 U JP7798385 U JP 7798385U JP 7798385 U JP7798385 U JP 7798385U JP S61195050 U JPS61195050 U JP S61195050U
- Authority
- JP
- Japan
- Prior art keywords
- processing
- processing tank
- rack
- tank
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 claims description 4
- 235000012431 wafers Nutrition 0.000 claims 4
- 238000010992 reflux Methods 0.000 claims 1
- 238000004381 surface treatment Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Weting (AREA)
Description
第１図ａ，ｂはこの考案に係る処理槽の一例を
示す正面図、平面図、第２図ａ，ｂ，ｃはこの考
案に係るラツクの一例を示す正面図、平面図、側
面図、第３図ａ，ｂはこの考案に係る処理槽内の
処理液に発生する環流の方向を示す説明図である
。
１……処理槽、２……ラツク、２１……把手、
２２……上部平板部、２３……下部平板部、２４
……突出部、２５ａ，２５ｂ……架台部、２６…
…溝。
Figures 1a and b are a front view and a plan view showing an example of a processing tank according to this invention; Figures 2a, b, and c are a front view, a top view, and a side view showing an example of a rack according to this invention; FIGS. 3a and 3b are explanatory diagrams showing the direction of circulation generated in the processing liquid in the processing tank according to this invention. 1... Processing tank, 2... Rack, 21... Handle,
22... Upper flat plate part, 23... Lower flat plate part, 24
...Protrusion part, 25a, 25b... Frame part, 26...
…groove.
Claims (1)
、円筒形状の処理槽と、該処理槽内においてウエ
ハを処理液面に対して傾斜保持するラツクとから
なり、処理槽内においてラツクを上下動して該処
理槽内の処理液に環流を発生させることができる
ようにしたことを特徴とするウエハの表面処理装
置。 A device that performs surface treatment on wafers using a processing liquid, and consists of a cylindrical processing tank and a rack that holds the wafer at an angle to the processing liquid level within the processing tank.The rack can be moved up and down within the processing tank. 1. A wafer surface processing apparatus, characterized in that a wafer surface processing apparatus is capable of generating a reflux in a processing liquid in the processing tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7798385U JPH0214199Y2 (en) | 1985-05-25 | 1985-05-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7798385U JPH0214199Y2 (en) | 1985-05-25 | 1985-05-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61195050U true JPS61195050U (en) | 1986-12-04 |
| JPH0214199Y2 JPH0214199Y2 (en) | 1990-04-18 |
Family
ID=30621548
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7798385U Expired JPH0214199Y2 (en) | 1985-05-25 | 1985-05-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0214199Y2 (en) |
-
1985
- 1985-05-25 JP JP7798385U patent/JPH0214199Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0214199Y2 (en) | 1990-04-18 |
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