JPS62142844U - - Google Patents

Info

Publication number
JPS62142844U
JPS62142844U JP3176786U JP3176786U JPS62142844U JP S62142844 U JPS62142844 U JP S62142844U JP 3176786 U JP3176786 U JP 3176786U JP 3176786 U JP3176786 U JP 3176786U JP S62142844 U JPS62142844 U JP S62142844U
Authority
JP
Japan
Prior art keywords
semiconductor wafer
processing tank
support plate
tank
grid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3176786U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3176786U priority Critical patent/JPS62142844U/ja
Publication of JPS62142844U publication Critical patent/JPS62142844U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の半導体ウエハ用処理槽の正面
図、第2図は第1図の側面図、第3図は第1図の
斜視図、第4図、第5図は従来の半導体ウエハ用
処理槽の正面図、第6図は第5図の側面図である
。 尚、図において、1…半導体ウエハ用処理槽の
側壁、2…半導体ウエハ用処理槽の底面、3…半
導体ウエハ用収納治具、4…不純物、5…半導体
ウエハ、6…支持板である。
Fig. 1 is a front view of the semiconductor wafer processing tank of the present invention, Fig. 2 is a side view of Fig. 1, Fig. 3 is a perspective view of Fig. 1, and Figs. 4 and 5 are conventional semiconductor wafer processing tanks. FIG. 6 is a front view of the processing tank, and FIG. 6 is a side view of FIG. In the figure, 1...side wall of the semiconductor wafer processing tank, 2...bottom of the semiconductor wafer processing tank, 3...semiconductor wafer storage jig, 4...impurities, 5...semiconductor wafer, 6...support plate.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 半導体ウエハ用処理槽内に半導体ウエハ用収納
治具の底面を支持するための格子状もしくは網目
状の支持板を少なくとも該処理槽底面より1cm以
上の高さに設置することを特徴とする半導体ウエ
ハ用処理槽。
A semiconductor wafer, characterized in that a grid-like or mesh-like support plate for supporting the bottom surface of a semiconductor wafer storage jig is installed in a semiconductor wafer processing tank at a height of at least 1 cm or more above the bottom surface of the processing tank. treatment tank.
JP3176786U 1986-03-04 1986-03-04 Pending JPS62142844U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3176786U JPS62142844U (en) 1986-03-04 1986-03-04

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3176786U JPS62142844U (en) 1986-03-04 1986-03-04

Publications (1)

Publication Number Publication Date
JPS62142844U true JPS62142844U (en) 1987-09-09

Family

ID=30837805

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3176786U Pending JPS62142844U (en) 1986-03-04 1986-03-04

Country Status (1)

Country Link
JP (1) JPS62142844U (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4817894U (en) * 1971-07-12 1973-02-28
JPS59175126A (en) * 1983-03-23 1984-10-03 Nec Corp Processing vessel for semiconductor wafer

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4817894U (en) * 1971-07-12 1973-02-28
JPS59175126A (en) * 1983-03-23 1984-10-03 Nec Corp Processing vessel for semiconductor wafer

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