JPH01167050U

JPH01167050U -

Info

Publication number: JPH01167050U
Application number: JP6363688U
Authority: JP
Priority date: 1988-05-14
Filing date: 1988-05-14
Publication date: 1989-11-22

Description

[Brief explanation of drawings]

図面はこの考案の一実施例を示すもので、第１
図は斜視図、第２図は半導体ウエハーを支持して
いる状態での要部側断面図、第３図は平面図、第
４図はプラズマ装置での使用状態の断面図である
。Ｗ……ウエハー、１……基台、２……天板、３
……入口支持枠、４……入口支持溝、５……奥部
支持枠、６……奥部支持溝、７……補助天板、８
……補強支持枠、９……横補強支持枠、１０……
プラズマ装置、１１……エレベータ、１２……反
応室。 The drawing shows one embodiment of this invention.
The figure is a perspective view, FIG. 2 is a sectional side view of the main part in a state where a semiconductor wafer is supported, FIG. 3 is a plan view, and FIG. 4 is a sectional view of the device in use in a plasma device. W...Wafer, 1...Base, 2...Top plate, 3
...Entrance support frame, 4...Entrance support groove, 5...Inner support frame, 6...Inner support groove, 7...Auxiliary top plate, 8
... Reinforcement support frame, 9 ... Lateral reinforcement support frame, 10 ...
Plasma device, 11... elevator, 12... reaction chamber.

Claims

[Claims for Utility Model Registration] 1. A plate-shaped base placed on an elevator lift base in a vertical plasma device, and a board-shaped base that is approximately parallel to the base and capable of storing a predetermined number of semiconductor wafers. A top plate that forms a storage area together with the base, and a rod-shaped rod that stands between the base and the top plate and is located to the left and right of the entrance to the storage area where wafers are inserted almost parallel to the base surface. An entrance support frame is formed with an entrance support groove into which the periphery of the wafer is inserted and supported, and a rod-shaped rod located at the back of the storage area that stands between the base and the top plate supports the wafer. The inner support frame is formed with a inner support groove into which the peripheral edge is fitted and supported, and the auxiliary ceiling is fixed to the entrance support frame and the inner support frame located below the top plate with a slight distance from the top plate. A wafer support comprising a plate and an appropriate number of reinforcing support frames erected between a base and a top plate. 2. The wafer support device according to claim 1, wherein the auxiliary top plate is fixed so that the rear thereof is tilted downward and substantially parallel to the supported wafer. 3. According to claim 1 or 2, the side edge of the base in the inner support groove is shifted from the side edge of the base in the entrance support groove. wafer support. 4 The width of the back support groove is made wider than the entrance support groove, so that the side edge of the back support groove near the top plate is on the same level as the side edge of the top plate of the entrance support groove. The wafer support according to any one of claims 1 to 3, wherein the wafer support is in a horizontal position.