JPS61195049U - - Google Patents
Info
- Publication number
- JPS61195049U JPS61195049U JP7863785U JP7863785U JPS61195049U JP S61195049 U JPS61195049 U JP S61195049U JP 7863785 U JP7863785 U JP 7863785U JP 7863785 U JP7863785 U JP 7863785U JP S61195049 U JPS61195049 U JP S61195049U
- Authority
- JP
- Japan
- Prior art keywords
- middle plate
- water discharge
- pure water
- chamber
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- 238000005406 washing Methods 0.000 claims description 6
- 238000004140 cleaning Methods 0.000 claims 3
- 235000012431 wafers Nutrition 0.000 claims 3
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Description
第１図は本考案の一実施例によるウエハ水洗槽
の断面図であり、第２図はその作用を示す要部拡
大斜視図であり、第３図は従来のウエハ水洗槽の
断面図である。
図中の符号１はウエハ、１ａはウエハ下面、２
はカセツト、２ａは内側面、３は純水供給口、４
は中板、４ａは放水穴、４ｂは放水室、５は排水
口、６は洗浄水、７は洗浄室、８は水洗槽、９は
純水放出室、１０は放水口、１１は純水供給口で
ある。なお、同一符号は同一又は相当部分を示す
。
Fig. 1 is a sectional view of a wafer washing tank according to an embodiment of the present invention, Fig. 2 is an enlarged perspective view of the main parts showing its operation, and Fig. 3 is a sectional view of a conventional wafer washing tank. . In the figure, numeral 1 is the wafer, 1a is the lower surface of the wafer, and 2
is the cassette, 2a is the inner surface, 3 is the pure water supply port, 4
is the middle plate, 4a is the water outlet, 4b is the water outlet, 5 is the drain, 6 is the washing water, 7 is the washing chamber, 8 is the washing tank, 9 is the pure water discharge chamber, 10 is the water outlet, 11 is the pure water This is the supply port. Note that the same reference numerals indicate the same or equivalent parts.
Claims (1)
室を設け、上部がこの洗浄室に収容載置されるウ
エハカセツトの内側に収まり、かつ該カセツトに
セツトされているウエハの下面に接触しない高さ
の純水放出室を中板から突出する如く設け、該純
水放出室の上面に放水口を設けたことを特徴とす
るウエハ水洗槽。 A cleaning chamber with a middle plate as the bottom is provided inside the box-shaped cleaning tank, and the upper part fits inside the wafer cassette that is placed in the cleaning chamber, and the bottom surface of the wafers set in the cassette is covered. A wafer washing tank characterized in that a pure water discharge chamber of a height that does not touch the middle plate is provided so as to protrude from the middle plate, and a water discharge port is provided on the upper surface of the pure water discharge chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7863785U JPS61195049U (en) | 1985-05-28 | 1985-05-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7863785U JPS61195049U (en) | 1985-05-28 | 1985-05-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61195049U true JPS61195049U (en) | 1986-12-04 |
Family
ID=30622794
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7863785U Pending JPS61195049U (en) | 1985-05-28 | 1985-05-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61195049U (en) |
-
1985
- 1985-05-28 JP JP7863785U patent/JPS61195049U/ja active Pending
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