JPH0321846U - - Google Patents
Info
- Publication number
- JPH0321846U JPH0321846U JP8244489U JP8244489U JPH0321846U JP H0321846 U JPH0321846 U JP H0321846U JP 8244489 U JP8244489 U JP 8244489U JP 8244489 U JP8244489 U JP 8244489U JP H0321846 U JPH0321846 U JP H0321846U
- Authority
- JP
- Japan
- Prior art keywords
- washing tank
- water
- carrier
- washing
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005406 washing Methods 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 claims 2
- 238000004140 cleaning Methods 0.000 claims 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Description
第１図はこの考案の一実施例を示す断面図、第
２図、第３図はその整流板の平面図、第４図は水
洗時間に対する各処理槽での薬液残量を示すグラ
フ、第５図と第６図イ，ロは整流板の溝の形状を
示す断面図、第７図は従来のこの種の水洗槽を示
す断面図、第８図はその整流板を示す平面図であ
る。
図中、１…水洗槽本体、２…注水口、３…底板
、４…整流板、６…ウエハ、７…キヤリア、８…
溝である。なお、図中同一符号は同一又は相当部
分を示す。
Fig. 1 is a sectional view showing an embodiment of this invention, Figs. 2 and 3 are plan views of the rectifying plate, Fig. 4 is a graph showing the amount of chemical solution remaining in each treatment tank against the washing time, and Fig. Figures 5 and 6 A and B are cross-sectional views showing the shape of the grooves in the current plate, Figure 7 is a cross-sectional view showing a conventional flushing tank of this type, and Figure 8 is a plan view showing the current plate. . In the figure, 1...washing tank body, 2...water inlet, 3...bottom plate, 4...straightening plate, 6...wafer, 7...carrier, 8...
It's a groove. Note that the same reference numerals in the figures indicate the same or equivalent parts.
Claims (1)
、ウエハを収納したキヤリアを入れて洗浄するよ
うにしたものにおいて、上記キヤリアと水洗槽の
間の間隔をできるだけあけずに約１cm程度以下と
なるように規定するとともに、上記整流板全面に
わたつて細長い溝をスリツト状に多数配設したこ
とを特徴とするウエハ洗浄用水洗槽。 In a device in which a carrier containing wafers is placed in a washing tank having a rectifying plate from which water spews out at the bottom for cleaning, the distance between the carrier and the washing tank should be kept as small as possible to about 1 cm or less. 1. A water washing tank for wafer washing, characterized in that a large number of elongated grooves are arranged in a slit shape over the entire surface of the current plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8244489U JPH0321846U (en) | 1989-07-13 | 1989-07-13 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8244489U JPH0321846U (en) | 1989-07-13 | 1989-07-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0321846U true JPH0321846U (en) | 1991-03-05 |
Family
ID=31629263
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8244489U Pending JPH0321846U (en) | 1989-07-13 | 1989-07-13 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0321846U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0531809U (en) * | 1991-10-14 | 1993-04-27 | 大昭和精機株式会社 | Tool holder |
| JP2014017369A (en) * | 2012-07-09 | 2014-01-30 | Sharp Corp | Cleaning apparatus and cleaning method |
-
1989
- 1989-07-13 JP JP8244489U patent/JPH0321846U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0531809U (en) * | 1991-10-14 | 1993-04-27 | 大昭和精機株式会社 | Tool holder |
| JP2014017369A (en) * | 2012-07-09 | 2014-01-30 | Sharp Corp | Cleaning apparatus and cleaning method |