JPS6393634U - - Google Patents

Info

Publication number
JPS6393634U
JPS6393634U JP18784986U JP18784986U JPS6393634U JP S6393634 U JPS6393634 U JP S6393634U JP 18784986 U JP18784986 U JP 18784986U JP 18784986 U JP18784986 U JP 18784986U JP S6393634 U JPS6393634 U JP S6393634U
Authority
JP
Japan
Prior art keywords
heat
vinyl chloride
chloride resin
resistant vinyl
treatment device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18784986U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP18784986U priority Critical patent/JPS6393634U/ja
Publication of JPS6393634U publication Critical patent/JPS6393634U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Weting (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの考案のウエツト装置の一実施例の
正面図、第2図は第1図のA―A′線から見た側
面図、第3図は同上実施例における流し部の拡大
斜視図、第4図は従来のウエツト処理装置の正面
図である。 1…高温薬液槽、2…洗浄槽、4…排液弁、5
…流し部、6…排液パイプ、11…弗素樹脂。
Fig. 1 is a front view of one embodiment of the wet device of this invention, Fig. 2 is a side view taken from line AA' in Fig. 1, and Fig. 3 is an enlarged perspective view of the sink in the same embodiment. , FIG. 4 is a front view of a conventional wet treatment apparatus. 1...High temperature chemical tank, 2...Washing tank, 4...Drain valve, 5
...Sink part, 6...Drainage pipe, 11...Fluororesin.

Claims (1)

【実用新案登録請求の範囲】 (1) (a) 半導体ウエハのウエツト処理装置の全
体の底面を成す流し部を耐熱塩化ビニール樹脂で
形成し、 (b) この耐熱塩化ビニール樹脂の内面に弗素
樹脂材で内槽を形成し、 てなることを特徴とするウエツト処理装置。 (2) 弗素樹脂材で形成した内槽は耐熱塩化ビニ
ール樹脂に溶接加工を施したことを特徴とする実
用新案登録請求の範囲第1項記載のウエツト処理
装置。
[Scope of Claim for Utility Model Registration] (1) (a) The sink portion forming the entire bottom of the semiconductor wafer wet processing equipment is formed of heat-resistant vinyl chloride resin, and (b) The inner surface of the heat-resistant vinyl chloride resin is coated with fluororesin. A wet treatment device characterized by having an inner tank made of wood. (2) The wet treatment device according to claim 1, wherein the inner tank is made of a fluororesin material and is made of heat-resistant vinyl chloride resin by welding.
JP18784986U 1986-12-08 1986-12-08 Pending JPS6393634U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18784986U JPS6393634U (en) 1986-12-08 1986-12-08

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18784986U JPS6393634U (en) 1986-12-08 1986-12-08

Publications (1)

Publication Number Publication Date
JPS6393634U true JPS6393634U (en) 1988-06-17

Family

ID=31138684

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18784986U Pending JPS6393634U (en) 1986-12-08 1986-12-08

Country Status (1)

Country Link
JP (1) JPS6393634U (en)

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