JPS6276534U - - Google Patents
Info
- Publication number
- JPS6276534U JPS6276534U JP16878185U JP16878185U JPS6276534U JP S6276534 U JPS6276534 U JP S6276534U JP 16878185 U JP16878185 U JP 16878185U JP 16878185 U JP16878185 U JP 16878185U JP S6276534 U JPS6276534 U JP S6276534U
- Authority
- JP
- Japan
- Prior art keywords
- chemical solution
- opening
- closing lid
- semiconductor device
- solution tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000126 substance Substances 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000012993 chemical processing Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Weting (AREA)
Description
第１図は本考案の一実施例の縦断面図、第２図
は従来の湿式化学処理装置の一例を説明するため
の図である。
１…シリコンウエハー、２…ウエハーホルダー
、３…薬液槽、４…薬液、５…ヒーター、６…蓋
、６ａ…誘導面、７…冷却管、８…水滴。
FIG. 1 is a longitudinal sectional view of an embodiment of the present invention, and FIG. 2 is a diagram for explaining an example of a conventional wet chemical processing apparatus. 1... Silicon wafer, 2... Wafer holder, 3... Chemical solution tank, 4... Chemical solution, 5... Heater, 6... Lid, 6a... Guide surface, 7... Cooling pipe, 8... Water droplet.
Claims (1)
槽と、該薬液槽の上部開口を閉塞する開閉蓋とを
有する半導体装置の製造装置において、前記開閉
蓋の底面に下向きに突出する中凸状の誘導面を設
けたことを特徴とする半導体装置の製造装置。 In a semiconductor device manufacturing apparatus having a chemical solution tank containing a chemical solution for chemically processing a semiconductor substrate, and an opening/closing lid that closes an upper opening of the chemical solution tank, a medium convex guide protruding downward from the bottom surface of the opening/closing lid. A manufacturing device for a semiconductor device, characterized in that a surface is provided.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16878185U JPS6276534U (en) | 1985-11-01 | 1985-11-01 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16878185U JPS6276534U (en) | 1985-11-01 | 1985-11-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6276534U true JPS6276534U (en) | 1987-05-16 |
Family
ID=31101973
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16878185U Pending JPS6276534U (en) | 1985-11-01 | 1985-11-01 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6276534U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100344092B1 (en) * | 1998-12-29 | 2002-11-23 | 주식회사 에스아이테크 | Cover structure of semiconductor equipment |
-
1985
- 1985-11-01 JP JP16878185U patent/JPS6276534U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100344092B1 (en) * | 1998-12-29 | 2002-11-23 | 주식회사 에스아이테크 | Cover structure of semiconductor equipment |
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