JPH0170338U - - Google Patents
Info
- Publication number
- JPH0170338U JPH0170338U JP1987165748U JP16574887U JPH0170338U JP H0170338 U JPH0170338 U JP H0170338U JP 1987165748 U JP1987165748 U JP 1987165748U JP 16574887 U JP16574887 U JP 16574887U JP H0170338 U JPH0170338 U JP H0170338U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- handle
- chemical solution
- processing
- holds
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005406 washing Methods 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
Landscapes
- Weting (AREA)
Description
第１図はこの考案の一実施例であるウエハを保
持するハンドルの斜視図、第２図はこの考案の一
実施例である薬液、水洗槽の斜視図、第３図はこ
の考案の一実施例であるウエハ台の斜視図、第４
図ａ〜ｃはこの考案におけるウエハの水洗の各段
階を示す説明図、第５図および第６図は従来の水
洗装置の斜視図である。
図において、１，２は薬液、水洗槽、３はハン
ドル、４はウエハ台、５はウエハ、６〜１０はウ
エハ５を保持する溝、１１はウエハ台４の柄柱を
示す。なお、図中、同一符号は同一または相当部
分を示す。
Fig. 1 is a perspective view of a handle for holding a wafer, which is an embodiment of this invention, Fig. 2 is a perspective view of a chemical solution and water washing tank, which is an embodiment of this invention, and Fig. 3 is an embodiment of this invention. Perspective view of an example wafer table, No. 4
Figures a to c are explanatory views showing each stage of wafer washing in this invention, and Figures 5 and 6 are perspective views of a conventional water washing apparatus. In the figure, reference numerals 1 and 2 indicate a chemical solution and a washing tank, 3 a handle, 4 a wafer stand, 5 a wafer, 6 to 10 grooves for holding the wafer 5, and 11 a handle post of the wafer stand 4. In addition, in the figures, the same reference numerals indicate the same or corresponding parts.
Claims (1)
理で、ウエハを保持するハンドルを用いてウエハ
台に移し換えるようにしたことを特徴とする半導
体水洗装置。 A semiconductor water washing device that performs etching processing using a chemical solution and washing processing using pure water, and is characterized in that the wafer is transferred to a wafer table using a handle that holds the wafer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987165748U JPH0170338U (en) | 1987-10-29 | 1987-10-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987165748U JPH0170338U (en) | 1987-10-29 | 1987-10-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0170338U true JPH0170338U (en) | 1989-05-10 |
Family
ID=31452515
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987165748U Pending JPH0170338U (en) | 1987-10-29 | 1987-10-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0170338U (en) |
-
1987
- 1987-10-29 JP JP1987165748U patent/JPH0170338U/ja active Pending