JPS6312346Y2 - - Google Patents
Info
- Publication number
- JPS6312346Y2 JPS6312346Y2 JP1984149954U JP14995484U JPS6312346Y2 JP S6312346 Y2 JPS6312346 Y2 JP S6312346Y2 JP 1984149954 U JP1984149954 U JP 1984149954U JP 14995484 U JP14995484 U JP 14995484U JP S6312346 Y2 JPS6312346 Y2 JP S6312346Y2
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- ion
- optical axis
- mask
- vram
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 14
- 230000003287 optical effect Effects 0.000 claims description 10
- 230000008439 repair process Effects 0.000 claims description 5
- 150000002500 ions Chemical class 0.000 description 14
- 230000015654 memory Effects 0.000 description 8
- 230000007547 defect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1984149954U JPS6312346Y2 (de) | 1984-10-03 | 1984-10-03 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1984149954U JPS6312346Y2 (de) | 1984-10-03 | 1984-10-03 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6166349U JPS6166349U (de) | 1986-05-07 |
JPS6312346Y2 true JPS6312346Y2 (de) | 1988-04-08 |
Family
ID=30708118
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1984149954U Expired JPS6312346Y2 (de) | 1984-10-03 | 1984-10-03 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6312346Y2 (de) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55150225A (en) * | 1979-05-11 | 1980-11-22 | Hitachi Ltd | Method of correcting white spot fault of photomask |
JPS5759325A (en) * | 1980-09-26 | 1982-04-09 | Toshiba Corp | Device for exposure of electron beam |
JPS5821326A (ja) * | 1981-07-29 | 1983-02-08 | Toshiba Corp | 電子ビ−ム描画装置のカセツト位置合わせ方法 |
JPS5856332A (ja) * | 1981-09-30 | 1983-04-04 | Hitachi Ltd | マスクの欠陥修正方法 |
-
1984
- 1984-10-03 JP JP1984149954U patent/JPS6312346Y2/ja not_active Expired
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55150225A (en) * | 1979-05-11 | 1980-11-22 | Hitachi Ltd | Method of correcting white spot fault of photomask |
JPS5759325A (en) * | 1980-09-26 | 1982-04-09 | Toshiba Corp | Device for exposure of electron beam |
JPS5821326A (ja) * | 1981-07-29 | 1983-02-08 | Toshiba Corp | 電子ビ−ム描画装置のカセツト位置合わせ方法 |
JPS5856332A (ja) * | 1981-09-30 | 1983-04-04 | Hitachi Ltd | マスクの欠陥修正方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6166349U (de) | 1986-05-07 |
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