JPS6274077A - Ｃｖｄ装置用サセプタ− - Google Patents

Ｃｖｄ装置用サセプタ−

Info

Publication number
JPS6274077A
JPS6274077A JP21540185A JP21540185A JPS6274077A JP S6274077 A JPS6274077 A JP S6274077A JP 21540185 A JP21540185 A JP 21540185A JP 21540185 A JP21540185 A JP 21540185A JP S6274077 A JPS6274077 A JP S6274077A
Authority
JP
Japan
Prior art keywords
susceptor
cvd
hydrofluoric acid
cvd treatment
cvd device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21540185A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0521985B2 (enExample
Inventor
Tomoyuki Katsumata
勝亦　朋之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP21540185A priority Critical patent/JPS6274077A/ja
Publication of JPS6274077A publication Critical patent/JPS6274077A/ja
Publication of JPH0521985B2 publication Critical patent/JPH0521985B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP21540185A 1985-09-28 1985-09-28 Ｃｖｄ装置用サセプタ− Granted JPS6274077A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21540185A JPS6274077A (ja) 1985-09-28 1985-09-28 Ｃｖｄ装置用サセプタ−

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21540185A JPS6274077A (ja) 1985-09-28 1985-09-28 Ｃｖｄ装置用サセプタ−

Publications (2)

Publication Number Publication Date
JPS6274077A true JPS6274077A (ja) 1987-04-04
JPH0521985B2 JPH0521985B2 (enExample) 1993-03-26

Family

ID=16671714

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21540185A Granted JPS6274077A (ja) 1985-09-28 1985-09-28 Ｃｖｄ装置用サセプタ−

Country Status (1)

Country Link
JP (1) JPS6274077A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02265607A (ja) * 1989-04-04 1990-10-30 I I C:Kk 浄水器

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2245524B1 (es) 1999-04-01 2007-03-16 Heeling Sports Limited Aparato y metodo de talonaje.

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4884029A (enExample) * 1972-02-12 1973-11-08
JPS54162619A (en) * 1978-06-14 1979-12-24 Showa Denko Kk Manufacture of lead-calcium alloy
JPS54162617A (en) * 1978-06-14 1979-12-24 Mitsubishi Heavy Ind Ltd Ni base alloy
JPS55152156A (en) * 1979-05-14 1980-11-27 Toshiba Corp Low expansion alloy
JPS5959861A (ja) * 1982-09-29 1984-04-05 Toshiba Corp 管内部品

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4884029A (enExample) * 1972-02-12 1973-11-08
JPS54162619A (en) * 1978-06-14 1979-12-24 Showa Denko Kk Manufacture of lead-calcium alloy
JPS54162617A (en) * 1978-06-14 1979-12-24 Mitsubishi Heavy Ind Ltd Ni base alloy
JPS55152156A (en) * 1979-05-14 1980-11-27 Toshiba Corp Low expansion alloy
JPS5959861A (ja) * 1982-09-29 1984-04-05 Toshiba Corp 管内部品

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02265607A (ja) * 1989-04-04 1990-10-30 I I C:Kk 浄水器

Also Published As

Publication number Publication date
JPH0521985B2 (enExample) 1993-03-26

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees