JPS6252550A - フオトマスク材料 - Google Patents

フオトマスク材料

Info

Publication number
JPS6252550A
JPS6252550A JP60192814A JP19281485A JPS6252550A JP S6252550 A JPS6252550 A JP S6252550A JP 60192814 A JP60192814 A JP 60192814A JP 19281485 A JP19281485 A JP 19281485A JP S6252550 A JPS6252550 A JP S6252550A
Authority
JP
Japan
Prior art keywords
silicide film
etching
transition metal
transparent substrate
titled material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60192814A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0469933B2 (OSRAM
Inventor
Yaichiro Watakabe
渡壁　弥一郎
Shuichi Matsuda
修一 松田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP60192814A priority Critical patent/JPS6252550A/ja
Priority to US06/837,356 priority patent/US4783371A/en
Priority to EP19860304473 priority patent/EP0213693B1/en
Priority to DE8686304473T priority patent/DE3680975D1/de
Publication of JPS6252550A publication Critical patent/JPS6252550A/ja
Priority to US07/064,392 priority patent/US4792461A/en
Publication of JPH0469933B2 publication Critical patent/JPH0469933B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/019—Contacts of silicides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/147—Silicides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/23907—Pile or nap type surface or component
    • Y10T428/2395—Nap type surface

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP60192814A 1985-08-30 1985-08-30 フオトマスク材料 Granted JPS6252550A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP60192814A JPS6252550A (ja) 1985-08-30 1985-08-30 フオトマスク材料
US06/837,356 US4783371A (en) 1985-08-30 1986-03-06 Photomask material
EP19860304473 EP0213693B1 (en) 1985-08-30 1986-06-11 Photomask material
DE8686304473T DE3680975D1 (de) 1985-08-30 1986-06-11 Photomaskenmaterial.
US07/064,392 US4792461A (en) 1985-08-30 1987-06-22 Method of forming a photomask material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60192814A JPS6252550A (ja) 1985-08-30 1985-08-30 フオトマスク材料

Publications (2)

Publication Number Publication Date
JPS6252550A true JPS6252550A (ja) 1987-03-07
JPH0469933B2 JPH0469933B2 (OSRAM) 1992-11-09

Family

ID=16297429

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60192814A Granted JPS6252550A (ja) 1985-08-30 1985-08-30 フオトマスク材料

Country Status (2)

Country Link
US (2) US4783371A (OSRAM)
JP (1) JPS6252550A (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63212937A (ja) * 1987-02-28 1988-09-05 Hoya Corp フオトマスクブランクとフオトマスク

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6195356A (ja) * 1984-10-16 1986-05-14 Mitsubishi Electric Corp フオトマスクブランク
US5020083A (en) * 1989-04-21 1991-05-28 Lepton Inc. X-ray masks, their fabrication and use
JP3064769B2 (ja) * 1992-11-21 2000-07-12 アルバック成膜株式会社 位相シフトマスクおよびその製造方法ならびにその位相シフトマスクを用いた露光方法
US5674647A (en) * 1992-11-21 1997-10-07 Ulvac Coating Corporation Phase shift mask and manufacturing method thereof and exposure method using phase shift mask
US5719926A (en) * 1994-06-10 1998-02-17 Communications Product Development, Inc. Prepaid long-distance telephone service system with flexible operating parameters
US6955725B2 (en) 2002-08-15 2005-10-18 Micron Technology, Inc. Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces
US6863930B2 (en) 2002-09-06 2005-03-08 Delphi Technologies, Inc. Refractory metal mask and methods for coating an article and forming a sensor
US7581511B2 (en) 2003-10-10 2009-09-01 Micron Technology, Inc. Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes
JP2006078825A (ja) 2004-09-10 2006-03-23 Shin Etsu Chem Co Ltd フォトマスクブランクおよびフォトマスクならびにこれらの製造方法
DE102004059355A1 (de) * 2004-12-09 2006-06-14 Basf Ag Verfahren zur Herstellung von Propan zu Propen

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5185380A (OSRAM) * 1975-05-21 1976-07-26 Dainippon Printing Co Ltd
JPS5193875A (OSRAM) * 1975-02-15 1976-08-17
JPS5269269A (en) * 1975-12-05 1977-06-08 Dainippon Printing Co Ltd Photomask
JPS56158453A (en) * 1980-05-12 1981-12-07 Mitsubishi Electric Corp Formation of pattern
JPS57157249A (en) * 1981-03-23 1982-09-28 Nec Corp Preparation of optical exposure mask
JPS57160127A (en) * 1981-03-27 1982-10-02 Nec Corp Manufacture of transcribe mask for x-ray exposure

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3712816A (en) * 1967-11-13 1973-01-23 Fairchild Camera Instr Co Process for making hard surface transparent mask
JPS5679449A (en) * 1979-11-30 1981-06-30 Mitsubishi Electric Corp Production of semiconductor device
JPS5748246A (en) * 1980-08-13 1982-03-19 Fujitsu Ltd Manufacture of semiconductor device
GB2097023B (en) * 1980-08-28 1985-08-14 Wisconsin Alumni Res Found Use of metallic glasses for fabrication of structures with submicron dimensions
JPS57157247A (en) * 1981-03-23 1982-09-28 Nec Corp Optical exposure mask
JPS5831336A (ja) * 1981-08-19 1983-02-24 Konishiroku Photo Ind Co Ltd ホトマスク素材
JPS61173250A (ja) * 1985-01-28 1986-08-04 Mitsubishi Electric Corp フオトマスク材料
JPS61273546A (ja) * 1985-05-29 1986-12-03 Mitsubishi Electric Corp 金属シリサイドフオトマスクの製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5193875A (OSRAM) * 1975-02-15 1976-08-17
JPS5185380A (OSRAM) * 1975-05-21 1976-07-26 Dainippon Printing Co Ltd
JPS5269269A (en) * 1975-12-05 1977-06-08 Dainippon Printing Co Ltd Photomask
JPS56158453A (en) * 1980-05-12 1981-12-07 Mitsubishi Electric Corp Formation of pattern
JPS57157249A (en) * 1981-03-23 1982-09-28 Nec Corp Preparation of optical exposure mask
JPS57160127A (en) * 1981-03-27 1982-10-02 Nec Corp Manufacture of transcribe mask for x-ray exposure

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63212937A (ja) * 1987-02-28 1988-09-05 Hoya Corp フオトマスクブランクとフオトマスク

Also Published As

Publication number Publication date
JPH0469933B2 (OSRAM) 1992-11-09
US4792461A (en) 1988-12-20
US4783371A (en) 1988-11-08

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