DE3680975D1 - Photomaskenmaterial. - Google Patents
Photomaskenmaterial.Info
- Publication number
- DE3680975D1 DE3680975D1 DE8686304473T DE3680975T DE3680975D1 DE 3680975 D1 DE3680975 D1 DE 3680975D1 DE 8686304473 T DE8686304473 T DE 8686304473T DE 3680975 T DE3680975 T DE 3680975T DE 3680975 D1 DE3680975 D1 DE 3680975D1
- Authority
- DE
- Germany
- Prior art keywords
- photomask material
- photomask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60192815A JPS6252551A (ja) | 1985-08-30 | 1985-08-30 | フオトマスク材料 |
JP60192814A JPS6252550A (ja) | 1985-08-30 | 1985-08-30 | フオトマスク材料 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3680975D1 true DE3680975D1 (de) | 1991-09-26 |
Family
ID=26507535
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8686304473T Expired - Lifetime DE3680975D1 (de) | 1985-08-30 | 1986-06-11 | Photomaskenmaterial. |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP0213693B1 (de) |
DE (1) | DE3680975D1 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5767321A (en) † | 1995-12-06 | 1998-06-16 | Union Carbide Chemicals & Plastics Technology Corporation | Metal-ligand complex catalyzed processes |
JP2006078825A (ja) | 2004-09-10 | 2006-03-23 | Shin Etsu Chem Co Ltd | フォトマスクブランクおよびフォトマスクならびにこれらの製造方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH658018A5 (de) * | 1980-08-28 | 1986-10-15 | Wisconsin Alumni Res Found | Oberflaechen-musterstrukturen aus amorphen metallen. |
JPS57157249A (en) * | 1981-03-23 | 1982-09-28 | Nec Corp | Preparation of optical exposure mask |
JPS57157247A (en) * | 1981-03-23 | 1982-09-28 | Nec Corp | Optical exposure mask |
JPS5831336A (ja) * | 1981-08-19 | 1983-02-24 | Konishiroku Photo Ind Co Ltd | ホトマスク素材 |
-
1986
- 1986-06-11 EP EP19860304473 patent/EP0213693B1/de not_active Expired
- 1986-06-11 DE DE8686304473T patent/DE3680975D1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0213693A3 (en) | 1988-01-07 |
EP0213693A2 (de) | 1987-03-11 |
EP0213693B1 (de) | 1991-08-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8320 | Willingness to grant licences declared (paragraph 23) | ||
8328 | Change in the person/name/address of the agent |
Representative=s name: PRUFER & PARTNER GBR, 81545 MUENCHEN |