JPS6249623A - Ｘ線露光マスク - Google Patents

Ｘ線露光マスク

Info

Publication number
JPS6249623A
JPS6249623A JP60160689A JP16068985A JPS6249623A JP S6249623 A JPS6249623 A JP S6249623A JP 60160689 A JP60160689 A JP 60160689A JP 16068985 A JP16068985 A JP 16068985A JP S6249623 A JPS6249623 A JP S6249623A
Authority
JP
Japan
Prior art keywords
film
exposure mask
ray
ray exposure
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60160689A
Other languages
English (en)
Japanese (ja)
Inventor
Katsumi Suzuki
克美 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP60160689A priority Critical patent/JPS6249623A/ja
Priority to DE19863624566 priority patent/DE3624566A1/de
Publication of JPS6249623A publication Critical patent/JPS6249623A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60160689A 1985-07-19 1985-07-19 Ｘ線露光マスク Pending JPS6249623A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60160689A JPS6249623A (ja) 1985-07-19 1985-07-19 Ｘ線露光マスク
DE19863624566 DE3624566A1 (de) 1985-07-19 1986-07-21 Maske fuer roentgenstrahl-lithographie

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60160689A JPS6249623A (ja) 1985-07-19 1985-07-19 Ｘ線露光マスク

Publications (1)

Publication Number Publication Date
JPS6249623A true JPS6249623A (ja) 1987-03-04

Family

ID=15720336

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60160689A Pending JPS6249623A (ja) 1985-07-19 1985-07-19 Ｘ線露光マスク

Country Status (2)

Country Link
JP (1) JPS6249623A (enrdf_load_stackoverflow)
DE (1) DE3624566A1 (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0217627A (ja) * 1988-07-06 1990-01-22 Fujitsu Ltd Ｘ線露光装置
JPH02181908A (ja) * 1989-01-09 1990-07-16 Canon Inc Ｘ線マスク構造体

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52105777A (en) * 1976-03-02 1977-09-05 Toshiba Corp Microscopic diagram transcribing device
JPS55157739A (en) * 1979-05-29 1980-12-08 Nec Corp X-ray exposure mask
JPS6068339A (ja) * 1983-09-26 1985-04-18 Canon Inc リソグラフィ−用マスク構造体
JPS60180123A (ja) * 1984-02-13 1985-09-13 Yokogawa Hewlett Packard Ltd Ｘ線マスク用構造体
JPS60186840A (ja) * 1984-02-16 1985-09-24 ヒューレット・パッカード・カンパニー Ｘ線マスクのための陽極接着方法及び装置
JPS60198819A (ja) * 1984-03-23 1985-10-08 Canon Inc リソグラフイ−用マスク構造体
JPS60251620A (ja) * 1984-05-29 1985-12-12 Hitachi Ltd Ｘ線マスク
JPS6135449A (ja) * 1984-07-07 1986-02-19 テレフンケン・エレクトロニク・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング レントゲンリトグラフイ用マスク
JPS61140942A (ja) * 1984-12-13 1986-06-28 Canon Inc リソグラフイ−用マスク構造体

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3435177A1 (de) * 1983-09-26 1985-04-11 Canon K.K., Tokio/Tokyo Maske fuer lithographische zwecke

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52105777A (en) * 1976-03-02 1977-09-05 Toshiba Corp Microscopic diagram transcribing device
JPS55157739A (en) * 1979-05-29 1980-12-08 Nec Corp X-ray exposure mask
JPS6068339A (ja) * 1983-09-26 1985-04-18 Canon Inc リソグラフィ−用マスク構造体
JPS60180123A (ja) * 1984-02-13 1985-09-13 Yokogawa Hewlett Packard Ltd Ｘ線マスク用構造体
JPS60186840A (ja) * 1984-02-16 1985-09-24 ヒューレット・パッカード・カンパニー Ｘ線マスクのための陽極接着方法及び装置
JPS60198819A (ja) * 1984-03-23 1985-10-08 Canon Inc リソグラフイ−用マスク構造体
JPS60251620A (ja) * 1984-05-29 1985-12-12 Hitachi Ltd Ｘ線マスク
JPS6135449A (ja) * 1984-07-07 1986-02-19 テレフンケン・エレクトロニク・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング レントゲンリトグラフイ用マスク
JPS61140942A (ja) * 1984-12-13 1986-06-28 Canon Inc リソグラフイ−用マスク構造体

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0217627A (ja) * 1988-07-06 1990-01-22 Fujitsu Ltd Ｘ線露光装置
JPH02181908A (ja) * 1989-01-09 1990-07-16 Canon Inc Ｘ線マスク構造体

Also Published As

Publication number Publication date
DE3624566A1 (de) 1987-04-16
DE3624566C2 (enrdf_load_stackoverflow) 1989-11-02

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