JPS6248211B2 - - Google Patents

Info

Publication number
JPS6248211B2
JPS6248211B2 JP54154179A JP15417979A JPS6248211B2 JP S6248211 B2 JPS6248211 B2 JP S6248211B2 JP 54154179 A JP54154179 A JP 54154179A JP 15417979 A JP15417979 A JP 15417979A JP S6248211 B2 JPS6248211 B2 JP S6248211B2
Authority
JP
Japan
Prior art keywords
resist
pattern
negative
resolution
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54154179A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5677843A (en
Inventor
Kazuo Toda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15417979A priority Critical patent/JPS5677843A/ja
Priority to DE8080304172T priority patent/DE3070128D1/de
Priority to EP80304172A priority patent/EP0030107B1/en
Publication of JPS5677843A publication Critical patent/JPS5677843A/ja
Publication of JPS6248211B2 publication Critical patent/JPS6248211B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
JP15417979A 1979-11-30 1979-11-30 Resist pattern forming method Granted JPS5677843A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP15417979A JPS5677843A (en) 1979-11-30 1979-11-30 Resist pattern forming method
DE8080304172T DE3070128D1 (en) 1979-11-30 1980-11-20 Process for forming resist pattern
EP80304172A EP0030107B1 (en) 1979-11-30 1980-11-20 Process for forming resist pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15417979A JPS5677843A (en) 1979-11-30 1979-11-30 Resist pattern forming method

Publications (2)

Publication Number Publication Date
JPS5677843A JPS5677843A (en) 1981-06-26
JPS6248211B2 true JPS6248211B2 (en, 2012) 1987-10-13

Family

ID=15578555

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15417979A Granted JPS5677843A (en) 1979-11-30 1979-11-30 Resist pattern forming method

Country Status (3)

Country Link
EP (1) EP0030107B1 (en, 2012)
JP (1) JPS5677843A (en, 2012)
DE (1) DE3070128D1 (en, 2012)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1138814B (it) * 1980-07-03 1986-09-17 Rca Corp Metodo per la formazione di disegni superficiali in rilievo con ultravioletto lontano e composizione protettiva fotoosensibile per questo metodo
JPS57160128A (en) * 1981-03-30 1982-10-02 Hitachi Ltd Fine pattern forming method
US4554237A (en) * 1981-12-25 1985-11-19 Hitach, Ltd. Photosensitive resin composition and method for forming fine patterns with said composition
JPS58203438A (ja) * 1982-05-24 1983-11-26 Hitachi Ltd 微細パタ−ン形成方法
EP0103052B1 (en) * 1982-08-25 1989-07-26 Fujitsu Limited Method for forming patterned resist layer on semiconductor body
DE3417607A1 (de) * 1983-05-12 1984-11-15 Hitachi Chemical Co., Ltd. Verfahren zur herstellung feiner muster
JP2505033B2 (ja) * 1988-11-28 1996-06-05 東京応化工業株式会社 電子線レジスト組成物及びそれを用いた微細パタ―ンの形成方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1447017B2 (de) * 1963-10-26 1971-08-12 Kalle AG, 6202 Wiesbaden Biebrich Verfahren zur herstellung von druckformen gedruckten schal tungen oder metallaetzungen
GB1347759A (en) * 1971-06-17 1974-02-27 Howson Algraphy Ltd Light sensitive materials
US3923522A (en) * 1973-07-18 1975-12-02 Oji Paper Co Photosensitive composition
JPS51105823A (en, 2012) * 1975-03-14 1976-09-20 Hitachi Ltd
JPS52128132A (en) * 1976-04-20 1977-10-27 Fujitsu Ltd Positive type electron beam sensitive composition
JPS6034745B2 (ja) * 1977-05-23 1985-08-10 王子製紙株式会社 感光性平版印刷版材料
JPS5417015A (en) * 1977-07-06 1979-02-08 Nec Corp Radiation sensitive composite

Also Published As

Publication number Publication date
DE3070128D1 (en) 1985-03-21
EP0030107B1 (en) 1985-02-06
JPS5677843A (en) 1981-06-26
EP0030107A1 (en) 1981-06-10

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