DE3070128D1 - Process for forming resist pattern - Google Patents
Process for forming resist patternInfo
- Publication number
- DE3070128D1 DE3070128D1 DE8080304172T DE3070128T DE3070128D1 DE 3070128 D1 DE3070128 D1 DE 3070128D1 DE 8080304172 T DE8080304172 T DE 8080304172T DE 3070128 T DE3070128 T DE 3070128T DE 3070128 D1 DE3070128 D1 DE 3070128D1
- Authority
- DE
- Germany
- Prior art keywords
- resist pattern
- forming resist
- forming
- pattern
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
- G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Polymerisation Methods In General (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15417979A JPS5677843A (en) | 1979-11-30 | 1979-11-30 | Resist pattern forming method |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3070128D1 true DE3070128D1 (en) | 1985-03-21 |
Family
ID=15578555
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8080304172T Expired DE3070128D1 (en) | 1979-11-30 | 1980-11-20 | Process for forming resist pattern |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0030107B1 (de) |
JP (1) | JPS5677843A (de) |
DE (1) | DE3070128D1 (de) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT1138814B (it) * | 1980-07-03 | 1986-09-17 | Rca Corp | Metodo per la formazione di disegni superficiali in rilievo con ultravioletto lontano e composizione protettiva fotoosensibile per questo metodo |
JPS57160128A (en) * | 1981-03-30 | 1982-10-02 | Hitachi Ltd | Fine pattern forming method |
US4554237A (en) * | 1981-12-25 | 1985-11-19 | Hitach, Ltd. | Photosensitive resin composition and method for forming fine patterns with said composition |
JPS58203438A (ja) * | 1982-05-24 | 1983-11-26 | Hitachi Ltd | 微細パタ−ン形成方法 |
DE3279843D1 (en) * | 1982-08-25 | 1989-08-31 | Fujitsu Ltd | Method for forming patterned resist layer on semiconductor body |
DE3417607A1 (de) * | 1983-05-12 | 1984-11-15 | Hitachi Chemical Co., Ltd. | Verfahren zur herstellung feiner muster |
JP2505033B2 (ja) * | 1988-11-28 | 1996-06-05 | 東京応化工業株式会社 | 電子線レジスト組成物及びそれを用いた微細パタ―ンの形成方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1447017B2 (de) * | 1963-10-26 | 1971-08-12 | Kalle AG, 6202 Wiesbaden Biebrich | Verfahren zur herstellung von druckformen gedruckten schal tungen oder metallaetzungen |
GB1347759A (en) * | 1971-06-17 | 1974-02-27 | Howson Algraphy Ltd | Light sensitive materials |
US3923522A (en) * | 1973-07-18 | 1975-12-02 | Oji Paper Co | Photosensitive composition |
JPS51105823A (de) * | 1975-03-14 | 1976-09-20 | Hitachi Ltd | |
JPS52128132A (en) * | 1976-04-20 | 1977-10-27 | Fujitsu Ltd | Positive type electron beam sensitive composition |
JPS6034745B2 (ja) * | 1977-05-23 | 1985-08-10 | 王子製紙株式会社 | 感光性平版印刷版材料 |
JPS5417015A (en) * | 1977-07-06 | 1979-02-08 | Nec Corp | Radiation sensitive composite |
-
1979
- 1979-11-30 JP JP15417979A patent/JPS5677843A/ja active Granted
-
1980
- 1980-11-20 DE DE8080304172T patent/DE3070128D1/de not_active Expired
- 1980-11-20 EP EP80304172A patent/EP0030107B1/de not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS5677843A (en) | 1981-06-26 |
JPS6248211B2 (de) | 1987-10-13 |
EP0030107B1 (de) | 1985-02-06 |
EP0030107A1 (de) | 1981-06-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE3066186D1 (en) | Process for producing ethylidenediacetate | |
ZA806994B (en) | Process for producing dimethylacarbonate | |
DE3466741D1 (en) | Process for forming pattern with negative resist | |
YU42347B (en) | Process for producing n-phosphono-methylglycine | |
DE3269563D1 (en) | Process for forming resist patterns | |
GB2045761B (en) | Process for producing chloro-trifluoromethylpyridines | |
ZA804455B (en) | Process for producing diesterdiamides | |
GB2054571B (en) | Process for producing p-chloroalkylbenzene | |
GB2048964B (en) | Resist printing process | |
DE3061556D1 (en) | Process for producing 2-chloro-6-nitrobenzonitrile | |
GB2042527B (en) | Process for selectively producing isosorbide-5-nitrate | |
JPS5638888A (en) | Pattern forming method | |
DE3070128D1 (en) | Process for forming resist pattern | |
JPS53135336A (en) | Pattern forming method | |
JPS54163680A (en) | Pattern forming method | |
GB2057430B (en) | Process for producing aminoaryl-sulphatoethylsulphone | |
JPS5646290A (en) | Character pattern forming method | |
DE3067179D1 (en) | Process for producing ethylidenediacetate | |
GB2052495B (en) | Process for making hexafluorotriallylisocyanurate | |
JPS5651898A (en) | Method of forming pattern | |
JPS5678192A (en) | Method of forming extrefine resist pattern | |
PH16157A (en) | Process for producing 3-0-demethylfortimicins | |
JPS54155234A (en) | Forming multiilevel pattern | |
DE3060356D1 (en) | Process for producing styrenes | |
DE3067213D1 (en) | Process for producing pyrogallol |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8339 | Ceased/non-payment of the annual fee |