JPH0438346B2 - - Google Patents

Info

Publication number
JPH0438346B2
JPH0438346B2 JP59131823A JP13182384A JPH0438346B2 JP H0438346 B2 JPH0438346 B2 JP H0438346B2 JP 59131823 A JP59131823 A JP 59131823A JP 13182384 A JP13182384 A JP 13182384A JP H0438346 B2 JPH0438346 B2 JP H0438346B2
Authority
JP
Japan
Prior art keywords
resist
radiation
monomer
exposed
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59131823A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6037548A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS6037548A publication Critical patent/JPS6037548A/ja
Publication of JPH0438346B2 publication Critical patent/JPH0438346B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP59131823A 1983-06-27 1984-06-26 照射線反応ネガレジストの形成方法 Granted JPS6037548A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US50765683A 1983-06-27 1983-06-27
US507656 1983-06-27

Publications (2)

Publication Number Publication Date
JPS6037548A JPS6037548A (ja) 1985-02-26
JPH0438346B2 true JPH0438346B2 (en, 2012) 1992-06-24

Family

ID=24019586

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59131823A Granted JPS6037548A (ja) 1983-06-27 1984-06-26 照射線反応ネガレジストの形成方法

Country Status (2)

Country Link
EP (1) EP0130088A3 (en, 2012)
JP (1) JPS6037548A (en, 2012)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0295457A3 (en) * 1987-05-29 1990-06-13 Hitachi, Ltd. Method for forming pattern by using graft copolymerization
DE3937308C1 (en, 2012) * 1989-11-09 1991-03-21 Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe, De
JP5515029B2 (ja) * 2009-09-11 2014-06-11 学校法人北里研究所 新規有機テルロニウムおよびセレノニウム化合物
JP5922908B2 (ja) * 2011-10-27 2016-05-24 富士フイルム株式会社 硬化物の製造方法および硬化物
JP6292817B2 (ja) * 2012-11-09 2018-03-14 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法
JP6306853B2 (ja) * 2012-11-15 2018-04-04 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法
JP6157315B2 (ja) * 2012-11-15 2017-07-05 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法
JP6306854B2 (ja) * 2012-11-15 2018-04-04 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1518141A (en) * 1974-05-02 1978-07-19 Gen Electric Polymerizable compositions
US4193799A (en) * 1976-07-09 1980-03-18 General Electric Company Method of making printing plates and printed circuit
JPS5332831A (en) * 1976-09-08 1978-03-28 Nippon Steel Corp Surface treatment method of metal
US4278753A (en) * 1980-02-25 1981-07-14 Horizons Research Incorporated Plasma developable photoresist composition with polyvinyl formal binder
JPS5744143A (en) * 1980-08-29 1982-03-12 Tokyo Ohka Kogyo Co Ltd Composition and method for forming micropattern
JPS57196229A (en) * 1981-05-26 1982-12-02 Horizons Research Inc Plasma developable photosensitive composition and formation and development of image

Also Published As

Publication number Publication date
JPS6037548A (ja) 1985-02-26
EP0130088A3 (en) 1986-07-02
EP0130088A2 (en) 1985-01-02

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees