JPS6240141B2 - - Google Patents
Info
- Publication number
- JPS6240141B2 JPS6240141B2 JP54082055A JP8205579A JPS6240141B2 JP S6240141 B2 JPS6240141 B2 JP S6240141B2 JP 54082055 A JP54082055 A JP 54082055A JP 8205579 A JP8205579 A JP 8205579A JP S6240141 B2 JPS6240141 B2 JP S6240141B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- wrapping
- ceramic
- mirror
- polishing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 10
- 239000013078 crystal Substances 0.000 claims description 8
- 239000000919 ceramic Substances 0.000 claims description 7
- 238000005498 polishing Methods 0.000 claims description 7
- 125000006850 spacer group Chemical group 0.000 claims description 7
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000007517 polishing process Methods 0.000 description 3
- 229910013641 LiNbO 3 Inorganic materials 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- ZPDRQAVGXHVGTB-UHFFFAOYSA-N gallium;gadolinium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Gd+3] ZPDRQAVGXHVGTB-UHFFFAOYSA-N 0.000 description 2
- WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical compound CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- XJUNRGGMKUAPAP-UHFFFAOYSA-N dioxido(dioxo)molybdenum;lead(2+) Chemical compound [Pb+2].[O-][Mo]([O-])(=O)=O XJUNRGGMKUAPAP-UHFFFAOYSA-N 0.000 description 1
- 239000013013 elastic material Substances 0.000 description 1
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 1
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 238000010897 surface acoustic wave method Methods 0.000 description 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8205579A JPS569161A (en) | 1979-06-30 | 1979-06-30 | Grinding method for ceramic or crystallized substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8205579A JPS569161A (en) | 1979-06-30 | 1979-06-30 | Grinding method for ceramic or crystallized substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS569161A JPS569161A (en) | 1981-01-30 |
| JPS6240141B2 true JPS6240141B2 (enExample) | 1987-08-26 |
Family
ID=13763820
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8205579A Granted JPS569161A (en) | 1979-06-30 | 1979-06-30 | Grinding method for ceramic or crystallized substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS569161A (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62106752U (enExample) * | 1985-12-26 | 1987-07-08 | ||
| JP2000084838A (ja) * | 1998-09-04 | 2000-03-28 | Nec Kansai Ltd | 研磨装置及び研磨方法 |
| CN116160321A (zh) * | 2022-12-14 | 2023-05-26 | 上海中晶企业发展有限公司 | 光学镜片平面面形补偿抛光方法 |
-
1979
- 1979-06-30 JP JP8205579A patent/JPS569161A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS569161A (en) | 1981-01-30 |
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