JPS6237384B2 - - Google Patents
Info
- Publication number
- JPS6237384B2 JPS6237384B2 JP19985583A JP19985583A JPS6237384B2 JP S6237384 B2 JPS6237384 B2 JP S6237384B2 JP 19985583 A JP19985583 A JP 19985583A JP 19985583 A JP19985583 A JP 19985583A JP S6237384 B2 JPS6237384 B2 JP S6237384B2
- Authority
- JP
- Japan
- Prior art keywords
- chromium
- transparent substrate
- film
- mask blank
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 42
- 239000011651 chromium Substances 0.000 claims description 34
- 229910052804 chromium Inorganic materials 0.000 claims description 29
- 239000000758 substrate Substances 0.000 claims description 23
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 claims description 22
- 239000007789 gas Substances 0.000 claims description 19
- CXOWYMLTGOFURZ-UHFFFAOYSA-N azanylidynechromium Chemical compound [Cr]#N CXOWYMLTGOFURZ-UHFFFAOYSA-N 0.000 claims description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 238000004544 sputter deposition Methods 0.000 claims description 4
- 238000007733 ion plating Methods 0.000 claims description 2
- 238000001771 vacuum deposition Methods 0.000 claims 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 230000007547 defect Effects 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 239000005361 soda-lime glass Substances 0.000 description 4
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 3
- 229910000423 chromium oxide Inorganic materials 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- LZDSILRDTDCIQT-UHFFFAOYSA-N dinitrogen trioxide Chemical compound [O-][N+](=O)N=O LZDSILRDTDCIQT-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 description 1
- -1 Next Chemical class 0.000 description 1
- 239000005407 aluminoborosilicate glass Substances 0.000 description 1
- SJKRCWUQJZIWQB-UHFFFAOYSA-N azane;chromium Chemical compound N.[Cr] SJKRCWUQJZIWQB-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 150000002829 nitrogen Chemical class 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- 229960001730 nitrous oxide Drugs 0.000 description 1
- 235000013842 nitrous oxide Nutrition 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/88—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by photographic processes for production of originals simulating relief
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58199855A JPS6091356A (ja) | 1983-10-25 | 1983-10-25 | クロムマスクブランクとその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58199855A JPS6091356A (ja) | 1983-10-25 | 1983-10-25 | クロムマスクブランクとその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6091356A JPS6091356A (ja) | 1985-05-22 |
| JPS6237384B2 true JPS6237384B2 (de) | 1987-08-12 |
Family
ID=16414767
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58199855A Granted JPS6091356A (ja) | 1983-10-25 | 1983-10-25 | クロムマスクブランクとその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6091356A (de) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07305163A (ja) * | 1994-05-10 | 1995-11-21 | Itochu Fine Chem Kk | 低反射クロム系膜 |
| WO1997015866A1 (fr) * | 1995-10-24 | 1997-05-01 | Ulvac Coating Corporation | Masque a changement de phase et son procede de fabrication |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0765156B2 (ja) * | 1985-10-09 | 1995-07-12 | セイコーエプソン株式会社 | 時計用外装部品の製造方法 |
| JPH0742568B2 (ja) * | 1985-10-22 | 1995-05-10 | セイコーエプソン株式会社 | 時計用外装部品 |
| JP2524103B2 (ja) * | 1985-10-22 | 1996-08-14 | セイコーエプソン株式会社 | 時計用外装部品 |
| US5449547A (en) * | 1993-03-15 | 1995-09-12 | Teikoku Piston Ring Co., Ltd. | Hard coating material, sliding member coated with hard coating material and method for manufacturing sliding member |
| TW480367B (en) * | 2000-02-16 | 2002-03-21 | Shinetsu Chemical Co | Photomask blank, photomask and method of manufacture |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54153790A (en) * | 1978-05-25 | 1979-12-04 | Fujitsu Ltd | Chromium oxide layer formation |
| JPS57104141A (en) * | 1980-12-22 | 1982-06-29 | Dainippon Printing Co Ltd | Photomask and photomask substrate |
-
1983
- 1983-10-25 JP JP58199855A patent/JPS6091356A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54153790A (en) * | 1978-05-25 | 1979-12-04 | Fujitsu Ltd | Chromium oxide layer formation |
| JPS57104141A (en) * | 1980-12-22 | 1982-06-29 | Dainippon Printing Co Ltd | Photomask and photomask substrate |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07305163A (ja) * | 1994-05-10 | 1995-11-21 | Itochu Fine Chem Kk | 低反射クロム系膜 |
| WO1997015866A1 (fr) * | 1995-10-24 | 1997-05-01 | Ulvac Coating Corporation | Masque a changement de phase et son procede de fabrication |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6091356A (ja) | 1985-05-22 |
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