JPS6227386B2 - - Google Patents
Info
- Publication number
- JPS6227386B2 JPS6227386B2 JP19978682A JP19978682A JPS6227386B2 JP S6227386 B2 JPS6227386 B2 JP S6227386B2 JP 19978682 A JP19978682 A JP 19978682A JP 19978682 A JP19978682 A JP 19978682A JP S6227386 B2 JPS6227386 B2 JP S6227386B2
- Authority
- JP
- Japan
- Prior art keywords
- chromium
- layer
- etching
- photomask blank
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 43
- 229910052804 chromium Inorganic materials 0.000 claims description 40
- 239000011651 chromium Substances 0.000 claims description 40
- 239000000758 substrate Substances 0.000 claims description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 12
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims description 11
- 229910000423 chromium oxide Inorganic materials 0.000 claims description 11
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- 238000005530 etching Methods 0.000 description 29
- 238000000034 method Methods 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 5
- 239000007789 gas Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 4
- 239000005361 soda-lime glass Substances 0.000 description 3
- XMPZTFVPEKAKFH-UHFFFAOYSA-P ceric ammonium nitrate Chemical compound [NH4+].[NH4+].[Ce+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O XMPZTFVPEKAKFH-UHFFFAOYSA-P 0.000 description 2
- 150000001844 chromium Chemical class 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57199786A JPS5990852A (ja) | 1982-11-16 | 1982-11-16 | フオトマスクブランク |
| US06/552,156 US4563407A (en) | 1982-11-16 | 1983-11-15 | Photo-mask blank comprising a shading layer having a variable etch rate |
| US06/816,213 US4696877A (en) | 1982-11-16 | 1986-01-06 | Photo-mask blank comprising a shading layer having a variable etch rate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57199786A JPS5990852A (ja) | 1982-11-16 | 1982-11-16 | フオトマスクブランク |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5990852A JPS5990852A (ja) | 1984-05-25 |
| JPS6227386B2 true JPS6227386B2 (de) | 1987-06-15 |
Family
ID=16413581
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57199786A Granted JPS5990852A (ja) | 1982-11-16 | 1982-11-16 | フオトマスクブランク |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5990852A (de) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1241524A2 (de) | 2001-02-13 | 2002-09-18 | Shin-Etsu Chemical Co., Ltd. | Maskenrohling, Fotomaske und Verfahren zu deren Herstellung |
| US6727027B2 (en) | 2000-12-26 | 2004-04-27 | Shin-Etsu Chemical Co., Ltd. | Photomask blank and photomask |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61232457A (ja) * | 1985-04-09 | 1986-10-16 | Asahi Glass Co Ltd | 改良されたフオトマスクブランク及びフオトマスク |
| JPS61240243A (ja) * | 1985-04-18 | 1986-10-25 | Asahi Glass Co Ltd | フオトマスクブランクおよびフオトマスク |
| JPS61272746A (ja) * | 1985-05-28 | 1986-12-03 | Asahi Glass Co Ltd | フオトマスクブランクおよびフオトマスク |
-
1982
- 1982-11-16 JP JP57199786A patent/JPS5990852A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6727027B2 (en) | 2000-12-26 | 2004-04-27 | Shin-Etsu Chemical Co., Ltd. | Photomask blank and photomask |
| EP1241524A2 (de) | 2001-02-13 | 2002-09-18 | Shin-Etsu Chemical Co., Ltd. | Maskenrohling, Fotomaske und Verfahren zu deren Herstellung |
| US6733930B2 (en) | 2001-02-13 | 2004-05-11 | Shin-Etsu Chemical Co., Ltd | Photomask blank, photomask and method of manufacture |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5990852A (ja) | 1984-05-25 |
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