JPS6091356A - クロムマスクブランクとその製造方法 - Google Patents

クロムマスクブランクとその製造方法

Info

Publication number
JPS6091356A
JPS6091356A JP58199855A JP19985583A JPS6091356A JP S6091356 A JPS6091356 A JP S6091356A JP 58199855 A JP58199855 A JP 58199855A JP 19985583 A JP19985583 A JP 19985583A JP S6091356 A JPS6091356 A JP S6091356A
Authority
JP
Japan
Prior art keywords
chromium
mask blank
base plate
film
transparent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58199855A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6237384B2 (de
Inventor
Masao Ushida
正男 牛田
Shigekazu Matsui
松井　茂和
Shuji Yoshida
修治 吉田
Masaru Mitsui
勝 三井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP58199855A priority Critical patent/JPS6091356A/ja
Publication of JPS6091356A publication Critical patent/JPS6091356A/ja
Publication of JPS6237384B2 publication Critical patent/JPS6237384B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/88—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by photographic processes for production of originals simulating relief

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Physical Vapour Deposition (AREA)
JP58199855A 1983-10-25 1983-10-25 クロムマスクブランクとその製造方法 Granted JPS6091356A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58199855A JPS6091356A (ja) 1983-10-25 1983-10-25 クロムマスクブランクとその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58199855A JPS6091356A (ja) 1983-10-25 1983-10-25 クロムマスクブランクとその製造方法

Publications (2)

Publication Number Publication Date
JPS6091356A true JPS6091356A (ja) 1985-05-22
JPS6237384B2 JPS6237384B2 (de) 1987-08-12

Family

ID=16414767

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58199855A Granted JPS6091356A (ja) 1983-10-25 1983-10-25 クロムマスクブランクとその製造方法

Country Status (1)

Country Link
JP (1) JPS6091356A (de)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6283461A (ja) * 1985-10-09 1987-04-16 Seiko Epson Corp 時計用外装部品の製造方法
JPS6296666A (ja) * 1985-10-22 1987-05-06 Seiko Epson Corp 時計用外装部品
JPS6296665A (ja) * 1985-10-22 1987-05-06 Seiko Epson Corp 時計用外装部品
GB2276176A (en) * 1993-03-15 1994-09-21 Teikoku Piston Ring Co Ltd Hard coating material based on chromium nitride and sliding member coated therewith
EP1130466A2 (de) * 2000-02-16 2001-09-05 Shin-Etsu Chemical Co., Ltd. Photomaskenrohling, Maske und Verfahren zu ihrer Herstellung

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5674647A (en) * 1992-11-21 1997-10-07 Ulvac Coating Corporation Phase shift mask and manufacturing method thereof and exposure method using phase shift mask
JPH07305163A (ja) * 1994-05-10 1995-11-21 Itochu Fine Chem Kk 低反射クロム系膜

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54153790A (en) * 1978-05-25 1979-12-04 Fujitsu Ltd Chromium oxide layer formation
JPS57104141A (en) * 1980-12-22 1982-06-29 Dainippon Printing Co Ltd Photomask and photomask substrate

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54153790A (en) * 1978-05-25 1979-12-04 Fujitsu Ltd Chromium oxide layer formation
JPS57104141A (en) * 1980-12-22 1982-06-29 Dainippon Printing Co Ltd Photomask and photomask substrate

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6283461A (ja) * 1985-10-09 1987-04-16 Seiko Epson Corp 時計用外装部品の製造方法
JPS6296666A (ja) * 1985-10-22 1987-05-06 Seiko Epson Corp 時計用外装部品
JPS6296665A (ja) * 1985-10-22 1987-05-06 Seiko Epson Corp 時計用外装部品
GB2276176A (en) * 1993-03-15 1994-09-21 Teikoku Piston Ring Co Ltd Hard coating material based on chromium nitride and sliding member coated therewith
US5449547A (en) * 1993-03-15 1995-09-12 Teikoku Piston Ring Co., Ltd. Hard coating material, sliding member coated with hard coating material and method for manufacturing sliding member
GB2276176B (en) * 1993-03-15 1996-12-04 Teikoku Piston Ring Co Ltd Hard coating material,sliding member coated with hard coating material and method for manufacturing sliding member
EP1130466A2 (de) * 2000-02-16 2001-09-05 Shin-Etsu Chemical Co., Ltd. Photomaskenrohling, Maske und Verfahren zu ihrer Herstellung
EP1130466A3 (de) * 2000-02-16 2003-05-07 Shin-Etsu Chemical Co., Ltd. Photomaskenrohling, Maske und Verfahren zu ihrer Herstellung

Also Published As

Publication number Publication date
JPS6237384B2 (de) 1987-08-12

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