JPS6236634B2 - - Google Patents
Info
- Publication number
- JPS6236634B2 JPS6236634B2 JP54143090A JP14309079A JPS6236634B2 JP S6236634 B2 JPS6236634 B2 JP S6236634B2 JP 54143090 A JP54143090 A JP 54143090A JP 14309079 A JP14309079 A JP 14309079A JP S6236634 B2 JPS6236634 B2 JP S6236634B2
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- damper
- wafer
- exhaust pipe
- exhaust
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 claims description 16
- 239000000126 substance Substances 0.000 claims description 14
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 239000007921 spray Substances 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 16
- 238000000034 method Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02118—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14309079A JPS5666044A (en) | 1979-11-05 | 1979-11-05 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14309079A JPS5666044A (en) | 1979-11-05 | 1979-11-05 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5666044A JPS5666044A (en) | 1981-06-04 |
JPS6236634B2 true JPS6236634B2 (it) | 1987-08-07 |
Family
ID=15330673
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14309079A Granted JPS5666044A (en) | 1979-11-05 | 1979-11-05 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5666044A (it) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5950525A (ja) * | 1982-09-16 | 1984-03-23 | M Setetsuku Kk | フオトレジストの塗布装置 |
JPS5950438U (ja) * | 1982-09-24 | 1984-04-03 | 富士通株式会社 | レジスト塗布装置 |
JPS5977223U (ja) * | 1982-11-16 | 1984-05-25 | ソニー株式会社 | 半導体洗浄装置 |
JPS5995629U (ja) * | 1982-12-20 | 1984-06-28 | 株式会社東芝 | レジスト塗布装置 |
JPS6088429A (ja) * | 1983-10-20 | 1985-05-18 | Fuji Electric Co Ltd | 半導体塗布拡散方法 |
JPS61157380A (ja) * | 1984-12-28 | 1986-07-17 | Fujitsu Ltd | 回転処理装置 |
JPS61160933A (ja) * | 1985-01-08 | 1986-07-21 | Nec Corp | 現像処理装置 |
JPS61251135A (ja) * | 1985-04-30 | 1986-11-08 | Toshiba Corp | 自動現像装置 |
JPS62117323A (ja) * | 1985-11-18 | 1987-05-28 | Toshiba Corp | 自動現像装置 |
JPH0611023B2 (ja) * | 1986-12-29 | 1994-02-09 | 東京エレクトロン株式会社 | 現像方法 |
JPS63119236A (ja) * | 1987-10-08 | 1988-05-23 | Fujitsu Ltd | レジスト塗布方法 |
JPH01244617A (ja) * | 1988-03-25 | 1989-09-29 | Tokyo Electron Ltd | レジスト塗布方法 |
JP2588854B2 (ja) * | 1995-01-27 | 1997-03-12 | 東京エレクトロン株式会社 | 現像装置 |
JP2006216803A (ja) * | 2005-02-04 | 2006-08-17 | Daikin Ind Ltd | 処理装置 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5612206B2 (it) * | 1973-06-08 | 1981-03-19 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53166861U (it) * | 1977-06-01 | 1978-12-27 | ||
JPS542376U (it) * | 1977-06-08 | 1979-01-09 | ||
JPS5612206U (it) * | 1979-07-06 | 1981-02-02 |
-
1979
- 1979-11-05 JP JP14309079A patent/JPS5666044A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5612206B2 (it) * | 1973-06-08 | 1981-03-19 |
Also Published As
Publication number | Publication date |
---|---|
JPS5666044A (en) | 1981-06-04 |
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