JPS62260056A - クロムタ−ゲツト部材 - Google Patents
クロムタ−ゲツト部材Info
- Publication number
- JPS62260056A JPS62260056A JP10436086A JP10436086A JPS62260056A JP S62260056 A JPS62260056 A JP S62260056A JP 10436086 A JP10436086 A JP 10436086A JP 10436086 A JP10436086 A JP 10436086A JP S62260056 A JPS62260056 A JP S62260056A
- Authority
- JP
- Japan
- Prior art keywords
- film
- target member
- magnetic
- coercive force
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims description 3
- 239000011651 chromium Substances 0.000 title claims 3
- 229910052804 chromium Inorganic materials 0.000 title claims 2
- 238000004544 sputter deposition Methods 0.000 abstract description 12
- 229910052757 nitrogen Inorganic materials 0.000 abstract description 6
- 229910052760 oxygen Inorganic materials 0.000 abstract description 5
- 239000000843 powder Substances 0.000 abstract description 5
- 229910045601 alloy Inorganic materials 0.000 abstract description 3
- 239000000956 alloy Substances 0.000 abstract description 3
- 239000000203 mixture Substances 0.000 abstract description 3
- 229910002482 Cu–Ni Inorganic materials 0.000 abstract 1
- 239000007858 starting material Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 21
- 238000000034 method Methods 0.000 description 8
- 229910020630 Co Ni Inorganic materials 0.000 description 7
- 229910002440 Co–Ni Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 239000010409 thin film Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 230000005415 magnetization Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 238000010298 pulverizing process Methods 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910018559 Ni—Nb Inorganic materials 0.000 description 1
- -1 and more recently Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910001566 austenite Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004868 gas analysis Methods 0.000 description 1
- 238000005098 hot rolling Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 239000006247 magnetic powder Substances 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000004663 powder metallurgy Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10436086A JPS62260056A (ja) | 1986-05-07 | 1986-05-07 | クロムタ−ゲツト部材 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10436086A JPS62260056A (ja) | 1986-05-07 | 1986-05-07 | クロムタ−ゲツト部材 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62260056A true JPS62260056A (ja) | 1987-11-12 |
| JPH0448868B2 JPH0448868B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-08-07 |
Family
ID=14378670
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10436086A Granted JPS62260056A (ja) | 1986-05-07 | 1986-05-07 | クロムタ−ゲツト部材 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62260056A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005220444A (ja) * | 2005-03-31 | 2005-08-18 | Nikko Materials Co Ltd | 高純度金属、高純度金属からなるスパッタリングターゲット及びスパッタリングにより形成した薄膜並びに高純度金属の製造方法 |
| JP2021006655A (ja) * | 2019-06-28 | 2021-01-21 | 三菱マテリアル株式会社 | スパッタリングターゲット、及び、スパッタリングターゲットの製造方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53114739A (en) * | 1977-03-18 | 1978-10-06 | Toyo Soda Mfg Co Ltd | Molding of metal for surface coating and their preparation |
-
1986
- 1986-05-07 JP JP10436086A patent/JPS62260056A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53114739A (en) * | 1977-03-18 | 1978-10-06 | Toyo Soda Mfg Co Ltd | Molding of metal for surface coating and their preparation |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005220444A (ja) * | 2005-03-31 | 2005-08-18 | Nikko Materials Co Ltd | 高純度金属、高純度金属からなるスパッタリングターゲット及びスパッタリングにより形成した薄膜並びに高純度金属の製造方法 |
| JP2021006655A (ja) * | 2019-06-28 | 2021-01-21 | 三菱マテリアル株式会社 | スパッタリングターゲット、及び、スパッタリングターゲットの製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0448868B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-08-07 |
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