JPH0448868B2 - - Google Patents

Info

Publication number
JPH0448868B2
JPH0448868B2 JP61104360A JP10436086A JPH0448868B2 JP H0448868 B2 JPH0448868 B2 JP H0448868B2 JP 61104360 A JP61104360 A JP 61104360A JP 10436086 A JP10436086 A JP 10436086A JP H0448868 B2 JPH0448868 B2 JP H0448868B2
Authority
JP
Japan
Prior art keywords
film
magnetic
target
sputtering
pure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61104360A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62260056A (ja
Inventor
Tsutomu Inui
Shunichiro Matsumoto
Takeo Mizuguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Hitachi Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Metals Ltd filed Critical Hitachi Metals Ltd
Priority to JP10436086A priority Critical patent/JPS62260056A/ja
Publication of JPS62260056A publication Critical patent/JPS62260056A/ja
Publication of JPH0448868B2 publication Critical patent/JPH0448868B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)
  • Physical Vapour Deposition (AREA)
JP10436086A 1986-05-07 1986-05-07 クロムタ−ゲツト部材 Granted JPS62260056A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10436086A JPS62260056A (ja) 1986-05-07 1986-05-07 クロムタ−ゲツト部材

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10436086A JPS62260056A (ja) 1986-05-07 1986-05-07 クロムタ−ゲツト部材

Publications (2)

Publication Number Publication Date
JPS62260056A JPS62260056A (ja) 1987-11-12
JPH0448868B2 true JPH0448868B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-08-07

Family

ID=14378670

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10436086A Granted JPS62260056A (ja) 1986-05-07 1986-05-07 クロムタ−ゲツト部材

Country Status (1)

Country Link
JP (1) JPS62260056A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005220444A (ja) * 2005-03-31 2005-08-18 Nikko Materials Co Ltd 高純度金属、高純度金属からなるスパッタリングターゲット及びスパッタリングにより形成した薄膜並びに高純度金属の製造方法
JP2021006655A (ja) * 2019-06-28 2021-01-21 三菱マテリアル株式会社 スパッタリングターゲット、及び、スパッタリングターゲットの製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS604241B2 (ja) * 1977-03-18 1985-02-02 東ソー株式会社 表面被覆材用金属成型体

Also Published As

Publication number Publication date
JPS62260056A (ja) 1987-11-12

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