JPS6224501B2 - - Google Patents

Info

Publication number
JPS6224501B2
JPS6224501B2 JP7371478A JP7371478A JPS6224501B2 JP S6224501 B2 JPS6224501 B2 JP S6224501B2 JP 7371478 A JP7371478 A JP 7371478A JP 7371478 A JP7371478 A JP 7371478A JP S6224501 B2 JPS6224501 B2 JP S6224501B2
Authority
JP
Japan
Prior art keywords
substrate
reaction chamber
gas
coating
coating layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7371478A
Other languages
English (en)
Japanese (ja)
Other versions
JPS552715A (en
Inventor
Akio Nishama
Noribumi Kikuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Metal Corp
Original Assignee
Mitsubishi Metal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Metal Corp filed Critical Mitsubishi Metal Corp
Priority to JP7371478A priority Critical patent/JPS552715A/ja
Publication of JPS552715A publication Critical patent/JPS552715A/ja
Publication of JPS6224501B2 publication Critical patent/JPS6224501B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using DC or AC discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Chemical Vapour Deposition (AREA)
JP7371478A 1978-06-20 1978-06-20 Coating method for base material surface with metallic nitride Granted JPS552715A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7371478A JPS552715A (en) 1978-06-20 1978-06-20 Coating method for base material surface with metallic nitride

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7371478A JPS552715A (en) 1978-06-20 1978-06-20 Coating method for base material surface with metallic nitride

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP7471984A Division JPS6036665A (ja) 1984-04-13 1984-04-13 金属窒化物による基体表面被覆方法

Publications (2)

Publication Number Publication Date
JPS552715A JPS552715A (en) 1980-01-10
JPS6224501B2 true JPS6224501B2 (enrdf_load_stackoverflow) 1987-05-28

Family

ID=13526156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7371478A Granted JPS552715A (en) 1978-06-20 1978-06-20 Coating method for base material surface with metallic nitride

Country Status (1)

Country Link
JP (1) JPS552715A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS581067A (ja) * 1981-06-26 1983-01-06 Toshiba Corp 装飾用金属窒化物皮膜の形成法
JPS62180900U (enrdf_load_stackoverflow) * 1986-05-09 1987-11-17
FR2726579A1 (fr) * 1994-11-07 1996-05-10 Neuville Stephane Procede de depot d'un revetement protecteur de type pseudo carbonne diamant amorphe
FR2726834B1 (fr) * 1994-11-07 1997-07-18 Neuville Stephane Procede de depot sur au moins une piece d'un revetement protecteur de grande durete

Also Published As

Publication number Publication date
JPS552715A (en) 1980-01-10

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