JPS6222264B2 - - Google Patents

Info

Publication number
JPS6222264B2
JPS6222264B2 JP60215088A JP21508885A JPS6222264B2 JP S6222264 B2 JPS6222264 B2 JP S6222264B2 JP 60215088 A JP60215088 A JP 60215088A JP 21508885 A JP21508885 A JP 21508885A JP S6222264 B2 JPS6222264 B2 JP S6222264B2
Authority
JP
Japan
Prior art keywords
pattern
dust
electron beam
sample
signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP60215088A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61116852A (ja
Inventor
Fumio Mizuno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Original Assignee
CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHO ERU ESU AI GIJUTSU KENKYU KUMIAI filed Critical CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Priority to JP60215088A priority Critical patent/JPS61116852A/ja
Publication of JPS61116852A publication Critical patent/JPS61116852A/ja
Publication of JPS6222264B2 publication Critical patent/JPS6222264B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP60215088A 1985-09-30 1985-09-30 レジスト膜中の塵挨検査方法 Granted JPS61116852A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60215088A JPS61116852A (ja) 1985-09-30 1985-09-30 レジスト膜中の塵挨検査方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60215088A JPS61116852A (ja) 1985-09-30 1985-09-30 レジスト膜中の塵挨検査方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP8134579A Division JPS567429A (en) 1979-06-29 1979-06-29 Patterning device

Publications (2)

Publication Number Publication Date
JPS61116852A JPS61116852A (ja) 1986-06-04
JPS6222264B2 true JPS6222264B2 (enrdf_load_stackoverflow) 1987-05-16

Family

ID=16666551

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60215088A Granted JPS61116852A (ja) 1985-09-30 1985-09-30 レジスト膜中の塵挨検査方法

Country Status (1)

Country Link
JP (1) JPS61116852A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5012952B2 (ja) * 2010-05-18 2012-08-29 大日本印刷株式会社 フォトマスクの欠陥修正方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51108580A (enrdf_load_stackoverflow) * 1975-03-19 1976-09-25 Fujitsu Ltd

Also Published As

Publication number Publication date
JPS61116852A (ja) 1986-06-04

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