JPS61116852A - レジスト膜中の塵挨検査方法 - Google Patents
レジスト膜中の塵挨検査方法Info
- Publication number
- JPS61116852A JPS61116852A JP60215088A JP21508885A JPS61116852A JP S61116852 A JPS61116852 A JP S61116852A JP 60215088 A JP60215088 A JP 60215088A JP 21508885 A JP21508885 A JP 21508885A JP S61116852 A JPS61116852 A JP S61116852A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- defects
- dust
- electron beam
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 9
- 230000001678 irradiating effect Effects 0.000 claims abstract description 3
- 238000007689 inspection Methods 0.000 claims description 8
- 230000003993 interaction Effects 0.000 claims description 2
- 230000007547 defect Effects 0.000 abstract description 26
- 238000010894 electron beam technology Methods 0.000 abstract description 20
- 239000000428 dust Substances 0.000 abstract description 18
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 3
- 239000002245 particle Substances 0.000 abstract description 2
- 230000002964 excitative effect Effects 0.000 abstract 1
- 238000001514 detection method Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 230000007246 mechanism Effects 0.000 description 2
- 206010011732 Cyst Diseases 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 208000031513 cyst Diseases 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000010606 normalization Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 230000000638 stimulation Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electron Beam Exposure (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60215088A JPS61116852A (ja) | 1985-09-30 | 1985-09-30 | レジスト膜中の塵挨検査方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60215088A JPS61116852A (ja) | 1985-09-30 | 1985-09-30 | レジスト膜中の塵挨検査方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8134579A Division JPS567429A (en) | 1979-06-29 | 1979-06-29 | Patterning device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61116852A true JPS61116852A (ja) | 1986-06-04 |
| JPS6222264B2 JPS6222264B2 (enrdf_load_stackoverflow) | 1987-05-16 |
Family
ID=16666551
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60215088A Granted JPS61116852A (ja) | 1985-09-30 | 1985-09-30 | レジスト膜中の塵挨検査方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61116852A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010217918A (ja) * | 2010-05-18 | 2010-09-30 | Dainippon Printing Co Ltd | フォトマスクの欠陥修正方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51108580A (enrdf_load_stackoverflow) * | 1975-03-19 | 1976-09-25 | Fujitsu Ltd |
-
1985
- 1985-09-30 JP JP60215088A patent/JPS61116852A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51108580A (enrdf_load_stackoverflow) * | 1975-03-19 | 1976-09-25 | Fujitsu Ltd |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010217918A (ja) * | 2010-05-18 | 2010-09-30 | Dainippon Printing Co Ltd | フォトマスクの欠陥修正方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6222264B2 (enrdf_load_stackoverflow) | 1987-05-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0206633B1 (en) | Method of inspecting masks and apparatus thereof | |
| US4937458A (en) | Electron beam lithography apparatus including a beam blanking device utilizing a reference comparator | |
| US4264822A (en) | Electron beam testing method and apparatus of mask | |
| JPS61116852A (ja) | レジスト膜中の塵挨検査方法 | |
| JPS6228572B2 (enrdf_load_stackoverflow) | ||
| JPS61116851A (ja) | 検査装置 | |
| JPH0660815B2 (ja) | 荷電粒子ビームによるパターン欠陥検査方法およびその装置 | |
| JPS6258621A (ja) | 微細パタ−ン形成方法 | |
| JPS596537A (ja) | 欠陥検査装置 | |
| JP2005037291A (ja) | 欠陥検査装置および欠陥検査方法 | |
| JPH03235949A (ja) | マスク検査方法 | |
| JP3268713B2 (ja) | Ｘ線マスク検査法 | |
| JP2002216694A (ja) | 欠陥検査装置及びそれを用いたデバイス製造方法 | |
| JP2002008972A (ja) | 電子線露光装置及びその電子線露光方法 | |
| JPS6098342A (ja) | マスク欠陥検査方法 | |
| JP2655513B2 (ja) | 電子線露光装置 | |
| JPS6041456B2 (ja) | 電子線を用いたパタ−ン検査装置 | |
| JPH05216211A (ja) | マスクの検査方法および装置 | |
| JP2525221B2 (ja) | マスク修正装置 | |
| JPS5633829A (en) | Inspection of pattern | |
| JPH06273918A (ja) | 位相シフトマスクの残留欠陥修正方法とその装置 | |
| JPS60117637A (ja) | 集積回路テスタ | |
| JPS59119721A (ja) | パタ−ン検査方法 | |
| JPH06168995A (ja) | 欠陥検査装置 | |
| JP2001203246A (ja) | マスク検査方法 |