JPS6228572B2 - - Google Patents
Info
- Publication number
- JPS6228572B2 JPS6228572B2 JP8134579A JP8134579A JPS6228572B2 JP S6228572 B2 JPS6228572 B2 JP S6228572B2 JP 8134579 A JP8134579 A JP 8134579A JP 8134579 A JP8134579 A JP 8134579A JP S6228572 B2 JPS6228572 B2 JP S6228572B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- signal
- sample
- electron beam
- dust
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000007547 defect Effects 0.000 claims description 22
- 230000007246 mechanism Effects 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 239000002245 particle Substances 0.000 claims description 2
- 230000000638 stimulation Effects 0.000 claims description 2
- 238000010894 electron beam technology Methods 0.000 description 18
- 239000000428 dust Substances 0.000 description 16
- 238000001514 detection method Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 238000007689 inspection Methods 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 238000005136 cathodoluminescence Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000010606 normalization Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8134579A JPS567429A (en) | 1979-06-29 | 1979-06-29 | Patterning device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8134579A JPS567429A (en) | 1979-06-29 | 1979-06-29 | Patterning device |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60215087A Division JPS61116851A (ja) | 1985-09-30 | 1985-09-30 | 検査装置 |
JP60215088A Division JPS61116852A (ja) | 1985-09-30 | 1985-09-30 | レジスト膜中の塵挨検査方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS567429A JPS567429A (en) | 1981-01-26 |
JPS6228572B2 true JPS6228572B2 (enrdf_load_stackoverflow) | 1987-06-22 |
Family
ID=13743771
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8134579A Granted JPS567429A (en) | 1979-06-29 | 1979-06-29 | Patterning device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS567429A (enrdf_load_stackoverflow) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07118440B2 (ja) * | 1986-07-09 | 1995-12-18 | 東芝機械株式会社 | 電子ビ−ム描画装置 |
JP2516060B2 (ja) * | 1988-12-28 | 1996-07-10 | イデシギョー株式会社 | 動物用の糞尿処理材、糞尿処理材の製造方法、及び糞尿処理材の製造装置 |
JPH06296667A (ja) * | 1993-04-14 | 1994-10-25 | Tomoegawa Paper Co Ltd | 脱臭性ペレット及びその製造方法 |
-
1979
- 1979-06-29 JP JP8134579A patent/JPS567429A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS567429A (en) | 1981-01-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0206633B1 (en) | Method of inspecting masks and apparatus thereof | |
US3745358A (en) | Alignment method and apparatus for electron projection systems | |
US4528452A (en) | Alignment and detection system for electron image projectors | |
US4937458A (en) | Electron beam lithography apparatus including a beam blanking device utilizing a reference comparator | |
US4958074A (en) | Apparatus and method for inspecting a mask | |
US4264822A (en) | Electron beam testing method and apparatus of mask | |
JPS6228572B2 (enrdf_load_stackoverflow) | ||
JPS6222264B2 (enrdf_load_stackoverflow) | ||
CA1166766A (en) | Method and apparatus for forming a variable size electron beam | |
JPH0660815B2 (ja) | 荷電粒子ビームによるパターン欠陥検査方法およびその装置 | |
JPS6231931A (ja) | 電子ビ−ム照射装置および該装置による試験、測定方法 | |
JPS61116851A (ja) | 検査装置 | |
JPS6098342A (ja) | マスク欠陥検査方法 | |
JPS596537A (ja) | 欠陥検査装置 | |
JPH02165616A (ja) | 露光装置 | |
JP2002008972A (ja) | 電子線露光装置及びその電子線露光方法 | |
JPS6253939B2 (enrdf_load_stackoverflow) | ||
JPS59169133A (ja) | パタ−ン修正装置 | |
JP3083428B2 (ja) | 荷電粒子ビーム描画方法 | |
JP2655513B2 (ja) | 電子線露光装置 | |
JPH0587014B2 (enrdf_load_stackoverflow) | ||
JPS5633829A (en) | Inspection of pattern | |
JP2898726B2 (ja) | 荷電粒子ビーム露光方法 | |
JPS60117637A (ja) | 集積回路テスタ | |
JPH02238313A (ja) | マスク検査装置 |