JPS6214948B2 - - Google Patents
Info
- Publication number
- JPS6214948B2 JPS6214948B2 JP51123801A JP12380176A JPS6214948B2 JP S6214948 B2 JPS6214948 B2 JP S6214948B2 JP 51123801 A JP51123801 A JP 51123801A JP 12380176 A JP12380176 A JP 12380176A JP S6214948 B2 JPS6214948 B2 JP S6214948B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- oxide film
- silicon oxide
- type
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Bipolar Integrated Circuits (AREA)
- Bipolar Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12380176A JPS5349964A (en) | 1976-10-18 | 1976-10-18 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12380176A JPS5349964A (en) | 1976-10-18 | 1976-10-18 | Manufacture of semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5349964A JPS5349964A (en) | 1978-05-06 |
| JPS6214948B2 true JPS6214948B2 (enrdf_load_stackoverflow) | 1987-04-04 |
Family
ID=14869642
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12380176A Granted JPS5349964A (en) | 1976-10-18 | 1976-10-18 | Manufacture of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5349964A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56135965A (en) * | 1980-03-28 | 1981-10-23 | Nec Corp | Semiconductor device |
| JP3578110B2 (ja) | 2000-06-15 | 2004-10-20 | セイコーエプソン株式会社 | 電気光学装置および電子機器 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2214060C3 (de) * | 1972-03-23 | 1980-01-03 | Agfa-Gevaert Ag, 5090 Leverkusen | Fotografisches Aufzeichnungsmaterial |
| JPS5729063B2 (enrdf_load_stackoverflow) * | 1973-05-22 | 1982-06-21 | ||
| JPS5648981B2 (enrdf_load_stackoverflow) * | 1973-05-25 | 1981-11-19 | ||
| JPS562792B2 (enrdf_load_stackoverflow) * | 1974-03-30 | 1981-01-21 |
-
1976
- 1976-10-18 JP JP12380176A patent/JPS5349964A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5349964A (en) | 1978-05-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4920401A (en) | Bipolar transistors | |
| KR970004458B1 (ko) | 싱글 터브 반도체 장치 제조 방법 | |
| US4740482A (en) | Method of manufacturing bipolar transistor | |
| US4473940A (en) | Method of producing a semiconductor device | |
| JPS6214948B2 (enrdf_load_stackoverflow) | ||
| JP3092854B2 (ja) | 半導体デバイス用のセルフアラインメント技術 | |
| JPS628939B2 (enrdf_load_stackoverflow) | ||
| JPS6228587B2 (enrdf_load_stackoverflow) | ||
| JPS6123665B2 (enrdf_load_stackoverflow) | ||
| US4469535A (en) | Method of fabricating semiconductor integrated circuit devices | |
| JP3877459B2 (ja) | 半導体装置の製造方法 | |
| JPS6244862B2 (enrdf_load_stackoverflow) | ||
| JPS63221668A (ja) | シヨツトキ・バリア・ダイオ−ドおよびその製造方法 | |
| JP2526556B2 (ja) | ショットキバリヤダイオ−ドの製造方法 | |
| JPH01223741A (ja) | 半導体装置及びその製造方法 | |
| JPS6252966A (ja) | 半導体装置の製造方法 | |
| JPS5813032B2 (ja) | 半導体装置の製造方法 | |
| JPH0576769B2 (enrdf_load_stackoverflow) | ||
| JPH043432A (ja) | 半導体装置の製造方法 | |
| JPS61172369A (ja) | 半導体装置の製造方法 | |
| JPS5835363B2 (ja) | 半導体装置の製法 | |
| JPS639150A (ja) | 半導体装置の製造方法 | |
| JPH0576767B2 (enrdf_load_stackoverflow) | ||
| JPS59151459A (ja) | 半導体装置の製造方法 | |
| JPH0475663B2 (enrdf_load_stackoverflow) |