JPS621314B2 - - Google Patents
Info
- Publication number
- JPS621314B2 JPS621314B2 JP7663181A JP7663181A JPS621314B2 JP S621314 B2 JPS621314 B2 JP S621314B2 JP 7663181 A JP7663181 A JP 7663181A JP 7663181 A JP7663181 A JP 7663181A JP S621314 B2 JPS621314 B2 JP S621314B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- coated
- lever
- resist
- rotating shaft
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000576 coating method Methods 0.000 claims description 21
- 239000011248 coating agent Substances 0.000 claims description 20
- 239000000463 material Substances 0.000 claims description 4
- 239000007921 spray Substances 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 68
- 239000007788 liquid Substances 0.000 description 13
- 230000006835 compression Effects 0.000 description 5
- 238000007906 compression Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 3
- 238000011109 contamination Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
Landscapes
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7663181A JPS57194070A (en) | 1981-05-22 | 1981-05-22 | Double side coating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7663181A JPS57194070A (en) | 1981-05-22 | 1981-05-22 | Double side coating device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57194070A JPS57194070A (en) | 1982-11-29 |
JPS621314B2 true JPS621314B2 (enrdf_load_stackoverflow) | 1987-01-12 |
Family
ID=13610713
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7663181A Granted JPS57194070A (en) | 1981-05-22 | 1981-05-22 | Double side coating device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57194070A (enrdf_load_stackoverflow) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63185029A (ja) * | 1987-01-28 | 1988-07-30 | Hitachi Ltd | ウエハ処理装置 |
JPS63149279U (enrdf_load_stackoverflow) * | 1987-03-20 | 1988-09-30 | ||
JPS63240967A (ja) * | 1988-03-03 | 1988-10-06 | Toray Ind Inc | スピンコート装置 |
JP2833762B2 (ja) * | 1988-09-21 | 1998-12-09 | 株式会社芝浦製作所 | ガラス基板の乾燥装置 |
JPH0328722U (enrdf_load_stackoverflow) * | 1989-07-31 | 1991-03-22 |
-
1981
- 1981-05-22 JP JP7663181A patent/JPS57194070A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS57194070A (en) | 1982-11-29 |
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