JPS619654A - 水なし平版印刷版 - Google Patents

水なし平版印刷版

Info

Publication number
JPS619654A
JPS619654A JP12925184A JP12925184A JPS619654A JP S619654 A JPS619654 A JP S619654A JP 12925184 A JP12925184 A JP 12925184A JP 12925184 A JP12925184 A JP 12925184A JP S619654 A JPS619654 A JP S619654A
Authority
JP
Japan
Prior art keywords
photosensitive layer
layer
silicone rubber
printing plate
printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12925184A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0262857B2 (https=
Inventor
Mikio Tsuda
幹雄 津田
Masaya Asano
浅野　昌也
Norio Kawabe
川辺　紀雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP12925184A priority Critical patent/JPS619654A/ja
Publication of JPS619654A publication Critical patent/JPS619654A/ja
Publication of JPH0262857B2 publication Critical patent/JPH0262857B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP12925184A 1984-06-25 1984-06-25 水なし平版印刷版 Granted JPS619654A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12925184A JPS619654A (ja) 1984-06-25 1984-06-25 水なし平版印刷版

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12925184A JPS619654A (ja) 1984-06-25 1984-06-25 水なし平版印刷版

Publications (2)

Publication Number Publication Date
JPS619654A true JPS619654A (ja) 1986-01-17
JPH0262857B2 JPH0262857B2 (https=) 1990-12-26

Family

ID=15004940

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12925184A Granted JPS619654A (ja) 1984-06-25 1984-06-25 水なし平版印刷版

Country Status (1)

Country Link
JP (1) JPS619654A (https=)

Also Published As

Publication number Publication date
JPH0262857B2 (https=) 1990-12-26

Similar Documents

Publication Publication Date Title
JPS6154222B2 (https=)
JP3716429B2 (ja) 「水なし平版製版用処理液」
JPWO1997017634A1 (ja) 水なし平版製版用処理液
JPS619654A (ja) 水なし平版印刷版
JPS63163857A (ja) 水なし平版印刷版
JPS62161154A (ja) 水なし平版印刷用原板
JPS60153048A (ja) 湿し水不要平版印刷版
JPS59198460A (ja) 湿し水不要平版印刷版
JPH0365539B2 (https=)
JP3690037B2 (ja) 水なし平版印刷版原版
JP2507342B2 (ja) 水なし平版印刷用原版
JPS61241759A (ja) 水なし平版印刷版
JP2921092B2 (ja) 水なし平版製版用処理液
JPS6158824B2 (https=)
JP2507390B2 (ja) 水なし平版製版用処理液
JPH07104598B2 (ja) 水なし平版印刷用原版
JPS61231556A (ja) 水なし平版印刷版
JP2507428B2 (ja) 水なし平版印刷原版の製版方法
JPH042941B2 (https=)
JPH07325389A (ja) 水なし平版印刷版原版
JPH04254857A (ja) 湿し水不要感光性平版印刷版
JPS6322304B2 (https=)
JPS62170965A (ja) 画像形成用積層体の製版方法
JPS6247644A (ja) 湿し水不要ネガ型平版印刷版
JPH07253661A (ja) 水なし平版印刷用原版