JPS6180011A - 寸法測定装置 - Google Patents

寸法測定装置

Info

Publication number
JPS6180011A
JPS6180011A JP59201552A JP20155284A JPS6180011A JP S6180011 A JPS6180011 A JP S6180011A JP 59201552 A JP59201552 A JP 59201552A JP 20155284 A JP20155284 A JP 20155284A JP S6180011 A JPS6180011 A JP S6180011A
Authority
JP
Japan
Prior art keywords
pattern
image
unit
section
display
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59201552A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0445046B2 (enExample
Inventor
Masaaki Kano
加納　正明
Hisashi Furukawa
古川　寿志
Hiroshi Yamaji
山地　廣
Motosuke Miyoshi
元介 三好
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP59201552A priority Critical patent/JPS6180011A/ja
Publication of JPS6180011A publication Critical patent/JPS6180011A/ja
Publication of JPH0445046B2 publication Critical patent/JPH0445046B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP59201552A 1984-09-28 1984-09-28 寸法測定装置 Granted JPS6180011A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59201552A JPS6180011A (ja) 1984-09-28 1984-09-28 寸法測定装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59201552A JPS6180011A (ja) 1984-09-28 1984-09-28 寸法測定装置

Publications (2)

Publication Number Publication Date
JPS6180011A true JPS6180011A (ja) 1986-04-23
JPH0445046B2 JPH0445046B2 (enExample) 1992-07-23

Family

ID=16442937

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59201552A Granted JPS6180011A (ja) 1984-09-28 1984-09-28 寸法測定装置

Country Status (1)

Country Link
JP (1) JPS6180011A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6414854A (en) * 1987-07-08 1989-01-19 Nikon Corp Electron microscope for length measurement
EP0617257A1 (en) * 1993-03-23 1994-09-28 Hitachi, Ltd. Electron beam measuring apparatus
JP2002202115A (ja) * 2000-11-09 2002-07-19 Samsung Electronics Co Ltd 測定装置の自動測定エラー検出方法
US7787687B2 (en) 2005-10-31 2010-08-31 Kabushiki Kaisha Toshiba Pattern shape evaluation apparatus, pattern shape evaluation method, method of manufacturing semiconductor device, and program

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008521946A (ja) * 2004-11-25 2008-06-26 ビーエーエスエフ ソシエタス・ヨーロピア 有機発光ダイオード（ｏｌｅｄ）における遷移金属−カルベン錯体の使用
WO2009086209A2 (en) * 2007-12-21 2009-07-09 Arizona Board Of Regents For And On Behalf Of Arizona State University Platinum(ii) di(2-pyrazolyl)benzene chloride analogs and uses
JP2009525299A (ja) * 2006-01-31 2009-07-09 ビーエーエスエフ ソシエタス・ヨーロピア 遷移金属カルベン錯体の製造方法
WO2011045337A1 (de) * 2009-10-14 2011-04-21 Basf Se Dinukleare platin-carben-komplexe und deren verwendung in oleds
WO2011050003A2 (en) * 2009-10-19 2011-04-28 University Of Mississippi Air-stable, blue light emitting chemical compounds
WO2011156752A1 (en) * 2010-06-11 2011-12-15 Universal Display Corporation Delayed-fluorescence oled

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008521946A (ja) * 2004-11-25 2008-06-26 ビーエーエスエフ ソシエタス・ヨーロピア 有機発光ダイオード（ｏｌｅｄ）における遷移金属−カルベン錯体の使用
JP2009525299A (ja) * 2006-01-31 2009-07-09 ビーエーエスエフ ソシエタス・ヨーロピア 遷移金属カルベン錯体の製造方法
WO2009086209A2 (en) * 2007-12-21 2009-07-09 Arizona Board Of Regents For And On Behalf Of Arizona State University Platinum(ii) di(2-pyrazolyl)benzene chloride analogs and uses
WO2011045337A1 (de) * 2009-10-14 2011-04-21 Basf Se Dinukleare platin-carben-komplexe und deren verwendung in oleds
WO2011050003A2 (en) * 2009-10-19 2011-04-28 University Of Mississippi Air-stable, blue light emitting chemical compounds
WO2011156752A1 (en) * 2010-06-11 2011-12-15 Universal Display Corporation Delayed-fluorescence oled

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
JPN6017015858; ＭＥＲＣＳ， Ｌ． ｅｔ ａｌ．: Ｉｎｏｒｇａｎｉｃ Ｃｈｅｍｉｓｔｒｙ Ｖｏｌ．５０, 2011, ｐ．８１８８-９６ *
JPN6017015861; ＡＮＤＡＶＡＮ， Ｇ． Ｔ． Ｓ． ｅｔ ａｌ．: Ｊｏｕｒｎａｌ ｏｆ Ｏｒｇａｎｏｍｅｔａｌｌｉｃ Ｃｈｅｍｉｓｔｒｙ Ｖｏｌ．６９０, 2005, ｐ．５９３８-４７ *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6414854A (en) * 1987-07-08 1989-01-19 Nikon Corp Electron microscope for length measurement
EP0617257A1 (en) * 1993-03-23 1994-09-28 Hitachi, Ltd. Electron beam measuring apparatus
JP2002202115A (ja) * 2000-11-09 2002-07-19 Samsung Electronics Co Ltd 測定装置の自動測定エラー検出方法
US7787687B2 (en) 2005-10-31 2010-08-31 Kabushiki Kaisha Toshiba Pattern shape evaluation apparatus, pattern shape evaluation method, method of manufacturing semiconductor device, and program

Also Published As

Publication number Publication date
JPH0445046B2 (enExample) 1992-07-23

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