JPS6148966A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法Info
- Publication number
- JPS6148966A JPS6148966A JP59170690A JP17069084A JPS6148966A JP S6148966 A JPS6148966 A JP S6148966A JP 59170690 A JP59170690 A JP 59170690A JP 17069084 A JP17069084 A JP 17069084A JP S6148966 A JPS6148966 A JP S6148966A
- Authority
- JP
- Japan
- Prior art keywords
- type
- layer
- transistor
- base
- bipolar transistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/0112—Integrating together multiple components covered by H10D8/00, H10D10/00 or H10D18/00, e.g. integrating multiple BJTs
- H10D84/0116—Integrating together multiple components covered by H10D8/00, H10D10/00 or H10D18/00, e.g. integrating multiple BJTs the components including integrated injection logic [I2L]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/02—Manufacture or treatment characterised by using material-based technologies
- H10D84/03—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
- H10D84/038—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
Landscapes
- Bipolar Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59170690A JPS6148966A (ja) | 1984-08-16 | 1984-08-16 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59170690A JPS6148966A (ja) | 1984-08-16 | 1984-08-16 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6148966A true JPS6148966A (ja) | 1986-03-10 |
JPH0379870B2 JPH0379870B2 (enrdf_load_stackoverflow) | 1991-12-20 |
Family
ID=15909586
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59170690A Granted JPS6148966A (ja) | 1984-08-16 | 1984-08-16 | 半導体装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6148966A (enrdf_load_stackoverflow) |
-
1984
- 1984-08-16 JP JP59170690A patent/JPS6148966A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH0379870B2 (enrdf_load_stackoverflow) | 1991-12-20 |
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