JPS6142437B2 - - Google Patents
Info
- Publication number
- JPS6142437B2 JPS6142437B2 JP55086798A JP8679880A JPS6142437B2 JP S6142437 B2 JPS6142437 B2 JP S6142437B2 JP 55086798 A JP55086798 A JP 55086798A JP 8679880 A JP8679880 A JP 8679880A JP S6142437 B2 JPS6142437 B2 JP S6142437B2
- Authority
- JP
- Japan
- Prior art keywords
- type
- electrode
- semiconductor crystal
- layer
- electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0421—Electrical excitation ; Circuits therefor characterised by the semiconducting contacting layers
- H01S5/0422—Electrical excitation ; Circuits therefor characterised by the semiconducting contacting layers with n- and p-contacts on the same side of the active layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
- H01S5/2275—Buried mesa structure ; Striped active layer mesa created by etching
Landscapes
- Physics & Mathematics (AREA)
- Geometry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8679880A JPS5712579A (en) | 1980-06-26 | 1980-06-26 | Buried type semiconductor laser |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8679880A JPS5712579A (en) | 1980-06-26 | 1980-06-26 | Buried type semiconductor laser |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5712579A JPS5712579A (en) | 1982-01-22 |
| JPS6142437B2 true JPS6142437B2 (enExample) | 1986-09-20 |
Family
ID=13896803
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8679880A Granted JPS5712579A (en) | 1980-06-26 | 1980-06-26 | Buried type semiconductor laser |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5712579A (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58176774U (ja) * | 1982-05-21 | 1983-11-26 | 株式会社洋釣漁具 | 烏賊釣針 |
| JPS58176773U (ja) * | 1982-05-21 | 1983-11-26 | 株式会社洋釣漁具 | 烏賊釣針 |
| JP3241360B2 (ja) * | 1989-03-31 | 2001-12-25 | 三菱化学株式会社 | 光半導体装置 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS49110286A (enExample) * | 1973-02-21 | 1974-10-21 | ||
| JPS51138394A (en) * | 1975-05-26 | 1976-11-29 | Fujitsu Ltd | Semiconductor device |
| JPS6054797B2 (ja) * | 1978-07-18 | 1985-12-02 | 日本電気株式会社 | 半導体接合レ−ザ |
-
1980
- 1980-06-26 JP JP8679880A patent/JPS5712579A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5712579A (en) | 1982-01-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3242963B2 (ja) | レーザダイオード・導波路モノリシック集積デバイス | |
| US5665612A (en) | Method for fabricating a planar buried heterostructure laser diode | |
| JPH04214683A (ja) | メサ半導体装置の製造方法 | |
| JPS6142437B2 (enExample) | ||
| US5246877A (en) | Method of manufacturing a semiconductor device having a polycrystalline electrode region | |
| JP3421140B2 (ja) | 半導体レーザ装置の製造方法,および半導体レーザ装置 | |
| JP2792826B2 (ja) | 光スイッチおよびその製造方法 | |
| JPH1041579A (ja) | 半導体装置とその製造方法 | |
| JPH05102615A (ja) | 半導体装置およびその製造方法 | |
| KR100489479B1 (ko) | 반도체 레이저 다이오드 어레이 및 그 제조 방법 | |
| JP2592265B2 (ja) | 光電子集積回路装置 | |
| US10862268B2 (en) | Semiconductor device and method for manufacturing semiconductor device | |
| JP3162463B2 (ja) | 半導体素子およびその製造方法 | |
| JPS59202676A (ja) | プレ−ナ型発光素子 | |
| JPH11307805A (ja) | 導波路型フォトダイオード及びその製造方法 | |
| KR19990038944A (ko) | 수평 구조의 피아이엔 광 다이오드와 이종접합 쌍극자 트랜지스터의 결합 소자 및 그 제조방법 | |
| JP2757872B2 (ja) | 半導体装置及びその製造方法 | |
| JPS6244430B2 (enExample) | ||
| JPH0358191B2 (enExample) | ||
| JP2676761B2 (ja) | 半導体発光装置の製造方法 | |
| KR0175407B1 (ko) | 세 개의 에미터 영역을 가진 수평형 트랜지스터 및 제조 방법 | |
| JPH0715089A (ja) | 半導体発光装置およびその製造方法 | |
| JPS6062175A (ja) | 半導体装置の製造方法 | |
| JP2021190531A (ja) | Tvsダイオードおよびtvsダイオードの製造方法 | |
| JPS6396955A (ja) | 光電子集積回路の製造方法 |