JPS6142437B2 - - Google Patents

Info

Publication number
JPS6142437B2
JPS6142437B2 JP55086798A JP8679880A JPS6142437B2 JP S6142437 B2 JPS6142437 B2 JP S6142437B2 JP 55086798 A JP55086798 A JP 55086798A JP 8679880 A JP8679880 A JP 8679880A JP S6142437 B2 JPS6142437 B2 JP S6142437B2
Authority
JP
Japan
Prior art keywords
type
electrode
semiconductor crystal
layer
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55086798A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5712579A (en
Inventor
Yasuharu Suematsu
Shigehisa Arai
Katsumi Kishino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOKYO KOGYO DAIGAKUCHO
Original Assignee
TOKYO KOGYO DAIGAKUCHO
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOKYO KOGYO DAIGAKUCHO filed Critical TOKYO KOGYO DAIGAKUCHO
Priority to JP8679880A priority Critical patent/JPS5712579A/ja
Publication of JPS5712579A publication Critical patent/JPS5712579A/ja
Publication of JPS6142437B2 publication Critical patent/JPS6142437B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/227Buried mesa structure ; Striped active layer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/04Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
    • H01S5/042Electrical excitation ; Circuits therefor
    • H01S5/0421Electrical excitation ; Circuits therefor characterised by the semiconducting contacting layers
    • H01S5/0422Electrical excitation ; Circuits therefor characterised by the semiconducting contacting layers with n- and p-contacts on the same side of the active layer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/227Buried mesa structure ; Striped active layer
    • H01S5/2275Buried mesa structure ; Striped active layer mesa created by etching

Landscapes

  • Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)
JP8679880A 1980-06-26 1980-06-26 Buried type semiconductor laser Granted JPS5712579A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8679880A JPS5712579A (en) 1980-06-26 1980-06-26 Buried type semiconductor laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8679880A JPS5712579A (en) 1980-06-26 1980-06-26 Buried type semiconductor laser

Publications (2)

Publication Number Publication Date
JPS5712579A JPS5712579A (en) 1982-01-22
JPS6142437B2 true JPS6142437B2 (enExample) 1986-09-20

Family

ID=13896803

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8679880A Granted JPS5712579A (en) 1980-06-26 1980-06-26 Buried type semiconductor laser

Country Status (1)

Country Link
JP (1) JPS5712579A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58176774U (ja) * 1982-05-21 1983-11-26 株式会社洋釣漁具 烏賊釣針
JPS58176773U (ja) * 1982-05-21 1983-11-26 株式会社洋釣漁具 烏賊釣針
JP3241360B2 (ja) * 1989-03-31 2001-12-25 三菱化学株式会社 光半導体装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49110286A (enExample) * 1973-02-21 1974-10-21
JPS51138394A (en) * 1975-05-26 1976-11-29 Fujitsu Ltd Semiconductor device
JPS6054797B2 (ja) * 1978-07-18 1985-12-02 日本電気株式会社 半導体接合レ−ザ

Also Published As

Publication number Publication date
JPS5712579A (en) 1982-01-22

Similar Documents

Publication Publication Date Title
JP3242963B2 (ja) レーザダイオード・導波路モノリシック集積デバイス
US5665612A (en) Method for fabricating a planar buried heterostructure laser diode
JPH04214683A (ja) メサ半導体装置の製造方法
JPS6142437B2 (enExample)
US5246877A (en) Method of manufacturing a semiconductor device having a polycrystalline electrode region
JP3421140B2 (ja) 半導体レーザ装置の製造方法,および半導体レーザ装置
JP2792826B2 (ja) 光スイッチおよびその製造方法
JPH1041579A (ja) 半導体装置とその製造方法
JPH05102615A (ja) 半導体装置およびその製造方法
KR100489479B1 (ko) 반도체 레이저 다이오드 어레이 및 그 제조 방법
JP2592265B2 (ja) 光電子集積回路装置
US10862268B2 (en) Semiconductor device and method for manufacturing semiconductor device
JP3162463B2 (ja) 半導体素子およびその製造方法
JPS59202676A (ja) プレ−ナ型発光素子
JPH11307805A (ja) 導波路型フォトダイオード及びその製造方法
KR19990038944A (ko) 수평 구조의 피아이엔 광 다이오드와 이종접합 쌍극자 트랜지스터의 결합 소자 및 그 제조방법
JP2757872B2 (ja) 半導体装置及びその製造方法
JPS6244430B2 (enExample)
JPH0358191B2 (enExample)
JP2676761B2 (ja) 半導体発光装置の製造方法
KR0175407B1 (ko) 세 개의 에미터 영역을 가진 수평형 트랜지스터 및 제조 방법
JPH0715089A (ja) 半導体発光装置およびその製造方法
JPS6062175A (ja) 半導体装置の製造方法
JP2021190531A (ja) Tvsダイオードおよびtvsダイオードの製造方法
JPS6396955A (ja) 光電子集積回路の製造方法