JPS6141764A - 真空ア−ク反応性蒸着法及びその蒸着装置 - Google Patents
真空ア−ク反応性蒸着法及びその蒸着装置Info
- Publication number
- JPS6141764A JPS6141764A JP16159984A JP16159984A JPS6141764A JP S6141764 A JPS6141764 A JP S6141764A JP 16159984 A JP16159984 A JP 16159984A JP 16159984 A JP16159984 A JP 16159984A JP S6141764 A JPS6141764 A JP S6141764A
- Authority
- JP
- Japan
- Prior art keywords
- cathode
- vacuum arc
- vapor deposition
- reactive gas
- reactive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007740 vapor deposition Methods 0.000 title claims abstract description 14
- 238000000034 method Methods 0.000 title claims description 16
- 238000001704 evaporation Methods 0.000 claims abstract description 5
- 239000011148 porous material Substances 0.000 claims description 10
- 238000010891 electric arc Methods 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 230000008018 melting Effects 0.000 claims description 4
- 238000002844 melting Methods 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 4
- 238000007664 blowing Methods 0.000 claims description 2
- 239000000463 material Substances 0.000 abstract description 8
- 230000008020 evaporation Effects 0.000 abstract description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 4
- 239000000919 ceramic Substances 0.000 abstract description 2
- 238000007599 discharging Methods 0.000 abstract 2
- 239000007789 gas Substances 0.000 abstract 2
- 239000012495 reaction gas Substances 0.000 abstract 2
- 239000004020 conductor Substances 0.000 abstract 1
- 238000007796 conventional method Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 230000004927 fusion Effects 0.000 description 4
- 239000011810 insulating material Substances 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 239000010406 cathode material Substances 0.000 description 2
- 238000005524 ceramic coating Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 239000002345 surface coating layer Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16159984A JPS6141764A (ja) | 1984-08-02 | 1984-08-02 | 真空ア−ク反応性蒸着法及びその蒸着装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16159984A JPS6141764A (ja) | 1984-08-02 | 1984-08-02 | 真空ア−ク反応性蒸着法及びその蒸着装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6141764A true JPS6141764A (ja) | 1986-02-28 |
| JPH0225986B2 JPH0225986B2 (enrdf_load_stackoverflow) | 1990-06-06 |
Family
ID=15738210
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16159984A Granted JPS6141764A (ja) | 1984-08-02 | 1984-08-02 | 真空ア−ク反応性蒸着法及びその蒸着装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6141764A (enrdf_load_stackoverflow) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6318056A (ja) * | 1986-07-10 | 1988-01-25 | Nissin Electric Co Ltd | ア−ク式蒸発源 |
| JPH01132756A (ja) * | 1987-11-18 | 1989-05-25 | Kobe Steel Ltd | 耐摩耗性膜被覆方法 |
| JPH01287270A (ja) * | 1988-05-13 | 1989-11-17 | Matsushita Electric Ind Co Ltd | スパッタリング装置 |
| JPH05193916A (ja) * | 1992-01-24 | 1993-08-03 | Agency Of Ind Science & Technol | 窒化チタン薄膜 |
| US5843293A (en) * | 1995-01-23 | 1998-12-01 | Nissin Electric Co., Ltd. | Arc-type evaporator |
-
1984
- 1984-08-02 JP JP16159984A patent/JPS6141764A/ja active Granted
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6318056A (ja) * | 1986-07-10 | 1988-01-25 | Nissin Electric Co Ltd | ア−ク式蒸発源 |
| JPH01132756A (ja) * | 1987-11-18 | 1989-05-25 | Kobe Steel Ltd | 耐摩耗性膜被覆方法 |
| JPH01287270A (ja) * | 1988-05-13 | 1989-11-17 | Matsushita Electric Ind Co Ltd | スパッタリング装置 |
| JPH05193916A (ja) * | 1992-01-24 | 1993-08-03 | Agency Of Ind Science & Technol | 窒化チタン薄膜 |
| US5843293A (en) * | 1995-01-23 | 1998-12-01 | Nissin Electric Co., Ltd. | Arc-type evaporator |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0225986B2 (enrdf_load_stackoverflow) | 1990-06-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |