JPH0225986B2 - - Google Patents

Info

Publication number
JPH0225986B2
JPH0225986B2 JP16159984A JP16159984A JPH0225986B2 JP H0225986 B2 JPH0225986 B2 JP H0225986B2 JP 16159984 A JP16159984 A JP 16159984A JP 16159984 A JP16159984 A JP 16159984A JP H0225986 B2 JPH0225986 B2 JP H0225986B2
Authority
JP
Japan
Prior art keywords
cathode
vacuum arc
reactive gas
discharge surface
reactive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16159984A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6141764A (ja
Inventor
Hitoshi Shinno
Katsuo Fukutomi
Masakazu Fujitsuka
Masatoshi Okada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KAGAKU GIJUTSUCHO KINZOKU ZAIRYO GIJUTSU KENKYU SHOCHO
Original Assignee
KAGAKU GIJUTSUCHO KINZOKU ZAIRYO GIJUTSU KENKYU SHOCHO
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KAGAKU GIJUTSUCHO KINZOKU ZAIRYO GIJUTSU KENKYU SHOCHO filed Critical KAGAKU GIJUTSUCHO KINZOKU ZAIRYO GIJUTSU KENKYU SHOCHO
Priority to JP16159984A priority Critical patent/JPS6141764A/ja
Publication of JPS6141764A publication Critical patent/JPS6141764A/ja
Publication of JPH0225986B2 publication Critical patent/JPH0225986B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP16159984A 1984-08-02 1984-08-02 真空ア−ク反応性蒸着法及びその蒸着装置 Granted JPS6141764A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16159984A JPS6141764A (ja) 1984-08-02 1984-08-02 真空ア−ク反応性蒸着法及びその蒸着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16159984A JPS6141764A (ja) 1984-08-02 1984-08-02 真空ア−ク反応性蒸着法及びその蒸着装置

Publications (2)

Publication Number Publication Date
JPS6141764A JPS6141764A (ja) 1986-02-28
JPH0225986B2 true JPH0225986B2 (enrdf_load_stackoverflow) 1990-06-06

Family

ID=15738210

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16159984A Granted JPS6141764A (ja) 1984-08-02 1984-08-02 真空ア−ク反応性蒸着法及びその蒸着装置

Country Status (1)

Country Link
JP (1) JPS6141764A (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07122131B2 (ja) * 1986-07-10 1995-12-25 日新電機株式会社 ア−ク式蒸発源
JP2590349B2 (ja) * 1987-11-18 1997-03-12 株式会社神戸製鋼所 耐摩耗性膜被覆方法
JPH01287270A (ja) * 1988-05-13 1989-11-17 Matsushita Electric Ind Co Ltd スパッタリング装置
JPH0725523B2 (ja) * 1992-01-24 1995-03-22 工業技術院長 窒化チタン薄膜
JP3287163B2 (ja) * 1995-01-23 2002-05-27 日新電機株式会社 アーク式蒸発源

Also Published As

Publication number Publication date
JPS6141764A (ja) 1986-02-28

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term