JPS6139729B2 - - Google Patents

Info

Publication number
JPS6139729B2
JPS6139729B2 JP7111576A JP7111576A JPS6139729B2 JP S6139729 B2 JPS6139729 B2 JP S6139729B2 JP 7111576 A JP7111576 A JP 7111576A JP 7111576 A JP7111576 A JP 7111576A JP S6139729 B2 JPS6139729 B2 JP S6139729B2
Authority
JP
Japan
Prior art keywords
section
wafer
semiconductor wafer
jig
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7111576A
Other languages
English (en)
Japanese (ja)
Other versions
JPS52154370A (en
Inventor
Hiroto Nagatomo
Hiroshi Maejima
Shuichi Hanajima
Susumu Nanko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7111576A priority Critical patent/JPS52154370A/ja
Publication of JPS52154370A publication Critical patent/JPS52154370A/ja
Publication of JPS6139729B2 publication Critical patent/JPS6139729B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Pile Receivers (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Warehouses Or Storage Devices (AREA)
  • Collation Of Sheets And Webs (AREA)
  • Conveyance By Endless Belt Conveyors (AREA)
  • Sheets, Magazines, And Separation Thereof (AREA)
JP7111576A 1976-06-18 1976-06-18 Photo resist film treatment apparatus of semiconductor wafers Granted JPS52154370A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7111576A JPS52154370A (en) 1976-06-18 1976-06-18 Photo resist film treatment apparatus of semiconductor wafers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7111576A JPS52154370A (en) 1976-06-18 1976-06-18 Photo resist film treatment apparatus of semiconductor wafers

Publications (2)

Publication Number Publication Date
JPS52154370A JPS52154370A (en) 1977-12-22
JPS6139729B2 true JPS6139729B2 (enrdf_load_stackoverflow) 1986-09-05

Family

ID=13451230

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7111576A Granted JPS52154370A (en) 1976-06-18 1976-06-18 Photo resist film treatment apparatus of semiconductor wafers

Country Status (1)

Country Link
JP (1) JPS52154370A (enrdf_load_stackoverflow)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5522832A (en) * 1978-08-03 1980-02-18 Matsushita Electric Ind Co Ltd Semiconconductor manufacturing apparatus and method of manufacturing semiconductor device by use of its apparatus
JPS5681402A (en) * 1979-11-12 1981-07-03 Shinkawa Ltd Apparatus for feeding and carrying-out of sample
JPS5952845A (ja) * 1982-09-20 1984-03-27 Fujitsu Ltd 基板移替機
JPS5957447A (ja) * 1982-09-28 1984-04-03 Oki Electric Ind Co Ltd ウエハ搬送装置
JPS5957158U (ja) * 1982-10-08 1984-04-14 アイシン精機株式会社 格納ベツド用吊棚
JPS59117230A (ja) * 1982-12-24 1984-07-06 Hitachi Electronics Eng Co Ltd 部品移載装置
JPS6188240U (enrdf_load_stackoverflow) * 1984-11-15 1986-06-09
JPH0622251B2 (ja) * 1984-12-26 1994-03-23 株式会社東芝 半導体組立装置
JP2877744B2 (ja) * 1988-02-12 1999-03-31 東京エレクトロン株式会社 半導体基板のレジスト処理装置
JPH0618164B2 (ja) * 1988-03-30 1994-03-09 大日本スクリーン製造株式会社 ウエハ処理装置
WO2013151146A1 (ja) * 2012-04-06 2013-10-10 Ｎｓｋテクノロジー株式会社 露光装置及び露光方法

Also Published As

Publication number Publication date
JPS52154370A (en) 1977-12-22

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