JPS52154370A - Photo resist film treatment apparatus of semiconductor wafers - Google Patents

Photo resist film treatment apparatus of semiconductor wafers

Info

Publication number
JPS52154370A
JPS52154370A JP7111576A JP7111576A JPS52154370A JP S52154370 A JPS52154370 A JP S52154370A JP 7111576 A JP7111576 A JP 7111576A JP 7111576 A JP7111576 A JP 7111576A JP S52154370 A JPS52154370 A JP S52154370A
Authority
JP
Japan
Prior art keywords
semiconductor wafers
treatment apparatus
resist film
photo resist
film treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7111576A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6139729B2 (enrdf_load_stackoverflow
Inventor
Hiroto Nagatomo
Hiroshi Maejima
Shuichi Hanajima
Susumu Nanko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7111576A priority Critical patent/JPS52154370A/ja
Publication of JPS52154370A publication Critical patent/JPS52154370A/ja
Publication of JPS6139729B2 publication Critical patent/JPS6139729B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Collation Of Sheets And Webs (AREA)
  • Pile Receivers (AREA)
  • Conveyance By Endless Belt Conveyors (AREA)
  • Warehouses Or Storage Devices (AREA)
  • Sheets, Magazines, And Separation Thereof (AREA)
  • Drying Of Semiconductors (AREA)
JP7111576A 1976-06-18 1976-06-18 Photo resist film treatment apparatus of semiconductor wafers Granted JPS52154370A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7111576A JPS52154370A (en) 1976-06-18 1976-06-18 Photo resist film treatment apparatus of semiconductor wafers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7111576A JPS52154370A (en) 1976-06-18 1976-06-18 Photo resist film treatment apparatus of semiconductor wafers

Publications (2)

Publication Number Publication Date
JPS52154370A true JPS52154370A (en) 1977-12-22
JPS6139729B2 JPS6139729B2 (enrdf_load_stackoverflow) 1986-09-05

Family

ID=13451230

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7111576A Granted JPS52154370A (en) 1976-06-18 1976-06-18 Photo resist film treatment apparatus of semiconductor wafers

Country Status (1)

Country Link
JP (1) JPS52154370A (enrdf_load_stackoverflow)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5522832A (en) * 1978-08-03 1980-02-18 Matsushita Electric Ind Co Ltd Semiconconductor manufacturing apparatus and method of manufacturing semiconductor device by use of its apparatus
JPS5681402A (en) * 1979-11-12 1981-07-03 Shinkawa Ltd Apparatus for feeding and carrying-out of sample
JPS5952845A (ja) * 1982-09-20 1984-03-27 Fujitsu Ltd 基板移替機
JPS5957447A (ja) * 1982-09-28 1984-04-03 Oki Electric Ind Co Ltd ウエハ搬送装置
JPS5957158U (ja) * 1982-10-08 1984-04-14 アイシン精機株式会社 格納ベツド用吊棚
JPS59117230A (ja) * 1982-12-24 1984-07-06 Hitachi Electronics Eng Co Ltd 部品移載装置
JPS6188240U (enrdf_load_stackoverflow) * 1984-11-15 1986-06-09
JPS61154041A (ja) * 1984-12-26 1986-07-12 Toshiba Corp 半導体組立装置
JPH01251606A (ja) * 1988-03-30 1989-10-06 Dainippon Screen Mfg Co Ltd ウエハ処理装置
JPH08227928A (ja) * 1988-02-12 1996-09-03 Tokyo Electron Ltd レジスト処理装置及びレジスト処理方法
JP2013231962A (ja) * 2012-04-06 2013-11-14 Nsk Technology Co Ltd 露光装置及び露光方法

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5522832A (en) * 1978-08-03 1980-02-18 Matsushita Electric Ind Co Ltd Semiconconductor manufacturing apparatus and method of manufacturing semiconductor device by use of its apparatus
JPS5681402A (en) * 1979-11-12 1981-07-03 Shinkawa Ltd Apparatus for feeding and carrying-out of sample
JPS5952845A (ja) * 1982-09-20 1984-03-27 Fujitsu Ltd 基板移替機
JPS5957447A (ja) * 1982-09-28 1984-04-03 Oki Electric Ind Co Ltd ウエハ搬送装置
JPS5957158U (ja) * 1982-10-08 1984-04-14 アイシン精機株式会社 格納ベツド用吊棚
JPS59117230A (ja) * 1982-12-24 1984-07-06 Hitachi Electronics Eng Co Ltd 部品移載装置
JPS6188240U (enrdf_load_stackoverflow) * 1984-11-15 1986-06-09
JPS61154041A (ja) * 1984-12-26 1986-07-12 Toshiba Corp 半導体組立装置
JPH08227928A (ja) * 1988-02-12 1996-09-03 Tokyo Electron Ltd レジスト処理装置及びレジスト処理方法
JPH01251606A (ja) * 1988-03-30 1989-10-06 Dainippon Screen Mfg Co Ltd ウエハ処理装置
JP2013231962A (ja) * 2012-04-06 2013-11-14 Nsk Technology Co Ltd 露光装置及び露光方法

Also Published As

Publication number Publication date
JPS6139729B2 (enrdf_load_stackoverflow) 1986-09-05

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